Toho Technology Inc.

Chicago,  IL 
United States
http://www.tohotechnology.com
  • Booth: 7521

  Products

  • ECVPro+
    The Toho ECVPro+ is an all-in-one profiling system that delivers precise carrier concentration, doping, and depth analysis across advanced semiconductor materials. With unmatched accuracy, intuitive operation, and global support....

  • The Toho ECVPro+ is a market-leading, all-in-one electrochemical capacitance voltage (ECV) profiling system designed for high-precision carrier concentration and doping profile analysis in semiconductor materials. Leveraging advanced electrochemical etching and capacitance measurement techniques, the ECVPro+ delivers accurate, layer-by-layer insight into dopant distribution, carrier type (n or p), and depth profiling across complex epitaxial structures. This enables researchers and process engineers to identify performance-limiting defects, optimize material growth, and ensure device reliability. With support for a wide range of semiconductor materials—including wide bandgap compounds like GaN, InGaN, and AlGaN—the ECVPro+ is essential for developing next-generation devices in power electronics, optoelectronics, quantum computing, and more. Combining superior measurement capabilities, intuitive workflow, robust design, flexible software, and global support, the ECVPro+ sets the standard for advanced semiconductor characterization.
  • HL9900
    The HL9900 is a turnkey, high-performance Hall effect system for measuring resistivity, carrier concentration, and mobility in semiconductors. It’s modular, supports a wide range of materials, and features an intuitive user interface....

  • HL9900 is a turnkey, high performance hall effect system for the measurement of resistivity, carrier concentration, and mobility in semiconductors. Modular in concept, allowing easy upgrade paths, the system is suitable for a wide variety of materials, including silicon and compound semiconductors. HL9900 has both low and high resistivity measurement capabilities. With an intuitive user interface, no programming experience is required to set up or use the HL9900.
  • FLX Series
    Toho FLX systems offer precise thin film stress measurement with thermal cycling and auto-rotation. Using dual-wavelength tech, they analyze stress from -65°C to 500°C, ideal for R&D and production across various films and substrates....

  • With thermal cycling and ambient auto-rotation models available, the Toho FLX Thin Film Stress Measurement Systems offer Industry Standard capabilities for mass production and research facilities that demand accurate stress measurements on various films and substrates. Incorporating KLA-Tencor’s patented “Dual Wavelength” technology, Toho FLX Series tools precisely determine and analyze surface stress caused by deposited thin films. In-situ stress measurements can be made from -65°C to 500°C at heating rates up to 25°C per minute (the cooling unit to -65°C is optional). An understanding of stress variations with temperature is essential for characterizing material properties such as stress relaxation, moisture evolution, and phase changes.

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