Vistec Electron Beam GmbH

Jena,  Germany
https://www.vistec-semi.com
  • Booth: 1261

We understand E-BEAM.

Overview

Vistec Electron Beam GmbH, Jena (Germany) provides leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for industrial and advanced research applications (e.g. semiconductor manufacturing, incl. compound semiconductor, mask writing, photonics). Efficient data processing & innovative exposure strategies (e.g. Cell Projection) open up new applications (e.g. AR/VR). Vistec´s technology features automated handling, as well as high flexibility, writing accuracy and productivity and therefore is suitable for prototyping and low volume production. In addition to its production facility in Germany, Vistec maintains service & support centers in Asia Pacific, USA and Europe.

  Products

  • Vistec SB254
    The Vistec SB254 electron beam lithography system has been designed as a universal and cost-effective tool for both direct write and mask making applications to allow the customers to react quickly to market demands....

    • With its 210 x 210mm stage travel range it is the ideal tool for exposing masks up to 7inch and wafers up to 200mm diameter. The concept of the SB254 enables handling and exposure of transparent and non-transparent compound semiconductor materials. The modular system architecture allows your SB254 to be adapted to meet your application requirements. The small cleanroom footprint and the fully automated substrate handling as well as the state of the art operating and data preparation software will convince you of the excellence of the SB254 Series being part of the modular toolset Vistec is offering to its customers from the industry and applied research sector. 
  • Vistec SB3050-2
    The Vistec SB3050-2 – with Cell Projection (CP) option – is our commitment to semiconductor manufacturing professionals....

    • The Vistec SB3050-2 is today’s most advanced Electron Beam Lithography system with Variable Shaped Beam technology and full writing capability on mask or wafer substrates of up to 300 mm dimension.

Categories

205 Nanotechnology Equipment and Tools
  • Equipment, Nanotechnology Tools
    • 207 Process Equipment
  • Lithography/Exposure
    • 603 Simulation, Analysis; Modeling Software
  • Mask Making software & simulation
  • Simulation; Characterization; Verification Software
    • 700 Manufacturing Services
  • Calibration & Reference Standards

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