Single Wafer Cleaning Equipment
Model: HTS-300
Cleaning Process
Single-wafer cleaning equipment designed for 300-mm wafers
Key Features
- Achieves processing with minimal chemical consumption, utilizing only 150 cc
- Capable of high-temperature processing up to 240°C
- Strip process completed in as little as 30 seconds
- Effectively prevents fume (chemical vapor) diffusion through wafer inversion processing
- Customizable per customer’s requirements