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RENA Technologies GmbH

Guetenbach,  Germany
http://www.rena.com
  • Booth: 1161

Welcome to RENA Technologies GmbH!

Overview

About RENA Technologies GmbH

RENA - The art of wet processing.

RENA Technologies is the worldwide technological leader for wet chemical equipment. 

We provide the most valuable, innovative wet-chemical solutions for our clients to reach the next level of state-of-the-art.
We manufacture highest quality flexible and high-throughput equipment for producing semiconductor products for all manner of different sectors.
RENA equipment is used to treat the surfaces of semiconductor wafers, like etching, plating, cleaning and drying with standardized machines
and guaranteed processes or entirely customized equipment.

We have 3 manfacturing sites, 2 innovation hubs and more than 3.350 machines installed worldwide. We are constantly developing
the most efficient process for our clients to achieve perfect surface quality. With more than 100 engineers, 150 global service experts
at 20 service locations we work to make RENA machines a long-term success story.

For more information, visit https://www.rena.com.


  Products

  • Convergence
    Fully automated Processing Platform...

  • Features and Benefits

    • Dedicated versions for 200 and 300 mm
    • Precision - perfect process monitoring for tight process control
    • Fully customizable to any customer specification or wish
    • Full compliance with the SEMI standard
    • Carrierless or LMC processing
    • High throughput 
    • Up to GEM300 compatible
    • Stainless-steel version for Solvent application 
  • Revolution+
    Semi-automated wet bench for multi-step processes...

  • Features and Benefits

    • Dry-to-Dry Capabilities
    • up to 200 mm wafer
    • Multi-Step Sequences with parallel processing
    • SECS/GEM compatible
    • Low footprint
    • Up to 125 wph
    • Optional FFUs
    • EFEM Versions available
    • Stainless-steel version for Solvent application
  • ACE
    Advanced Chemical Etching for SiC-wafers...

  • Features and Benefits

    • Compact automated equipment
    • Essential for next generation power devices
    • Worlds first wet etching solution for SiC
    • Strain release
    • Defect removal

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