Photolithography
Photolithography machines generate a significant amount of heat during the exposure process. Chillers provide cooling water to maintain a constant temperature for the optical system and laser light source, ensuring exposure accuracy.
Etching
Plasma etching equipment requires rapid heat dissipation. Chillers stabilize the chamber temperature within a specified range, ensuring etching uniformity and process repeatability.
Ion Implantation
Ion implanters control temperature fluctuations within a specified range by cooling the target and beam components.
Chemical and Physical Vapor Deposition (CVD/PVD)
Controlling substrate temperature during the process impacts film quality and enables nanometer-level film thickness control.
Chemical Mechanical Polishing (CMP)
Chillers control process temperatures by cooling the polishing pad and drive system, reducing variations in polishing slurry viscosity and improving surface flatness.
Diffusion & Oxidation
Chillers can quickly dissipate heat, preventing furnace overheating and maintaining process temperature uniformity.