Accurate Wafer Temperature. Every Time.
NTM™ Series delivers non-contact, in situ wafer temperature monitoring for RTP, CVD, PVD, ALD, ALE, single-wafer wet processing, Glass, SiC, and other demanding semiconductor applications.
Using NIR and LWIR pyrometry, NTM provides rapid, accurate wafer temperature measurement across a broad range of process conditions. Real time emissivity measurement and compensation, combined with specialized background radiation subtraction algorithms, support accurate, repeatable monitoring even in challenging thermal environments.
Flexible configurations, in situ calibration sources, and application-optimized solutions enable NTM to address diverse process requirements, from low- to high-temperature measurement.
With thousands of probes operating 24/7 in fabs, NTM brings field-proven temperature metrology to critical semiconductor processes.
Precise temperature measurement. Proven fab reliability.