Advanced Energy

The eVoS® LE is an asymmetric bias waveform generator designed to achieve direct control of wafer-surface voltage and resulting ion energy distributions (IED) in plasma-based etch and deposition processes. The eVoS system consists of a bi-directional voltage supply combined with an independent current source to establish and control wafer-surface potential. The asymmetric output of the eVoS eliminates the limitations and restrictions of wafer biasing inherent to sinusoidal RF bias application. Fast digital metrology and novel control algorithms enable the production of near mono-energetic IEDs. Use additional parameters for customizing average and time-varying aspects of the wafer surface voltage and resulting ion energy distribution. 

As the semiconductor industry speeds toward a new inflection, the eVerest® RF generator fills the need for transformational plasma control. Its configurable multi-level pulsing enables instantaneous or user-defined transition timing. Additionally, high-speed, high-accuracy model-based frequency tuning with wide frequency sweep range provides greater process stability and control. These capabilities, plus faster setpoint response, controlled overshoot at the beginning of pulsing states, and sophisticated  performance insight and diagnostic tool empower process innovation for the next technology node.

Advanced Energy leads the market in plasma power delivery, temperature measurement, temperature control, and wafer control technologies for semiconductor manufacturing, including critical etching, deposition, chamber cleaning, inspection, implantation, and annealing. Through strategic partnerships, continuous innovation, and rapid design, we deliver solutions for your specific process requirements.

• Power Supplies for Semiconductor Etch Processes | Advanced Energy

• Deposition Power Supplies | DC, RF & Pulsed DC Systems | Advanced Energy