MLA 150 | ADVANCED MASKLESS ALIGNER
The MLA 150 Maskless Aligner accelerates innovation with sub-micron lithography down to 0.45 μm, eliminating photomasks and long lead times. From design to substrate in minutes—fast, flexible, and easy to use. Ideal for R&D, and industrial prototyping.
Key benefits:
- No photomasks required: Pattern directly from digital designs using a dynamic mirror device (DMD).
- Fast turnaround: Expose a full 150 mm wafer in under 16 minutes.
- Sub‑micron precision: Achieve feature sizes down to 0.45 µm.
- User‑friendly interface: Train new users in under an hour—ideal for shared lab environments.
Designed for R&D and small series production, the MLA 150 is built for flexibility, making it the perfect tool for academic research labs, industrial prototyping, small batch manufacturing. Applications include quantum devices, MEMS, micro-optics, and life sciences.
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