Artwork Conversion Software

Santa Cruz,  CA 
United States
https://www.artwork.com

• Booth: 5243

Welcome to Artwork Conversion Software

Overview

Artwork Conversion Software develops CAD translators, high speed viewers and high resolution rasterizers (vector to bitmap) for CAD data bases such as GDSII, Gerber, DXF, MEBES, OASIS, ODB++ (and more) for output to desktop or wide-format printers and plotters. We also write interface tools from all PCB software to simulation tools like Ansoft, AWR, CST, Agilent EDA and others. We can also export 3D data from your PCB so you can load that to tools such as ProEngineer, SolidWorks, AutoCAD and others.

  Press Releases

• Automated ODB++ Digital Lithography Verification (Jun 12, 2026)

  Advanced Digital Lithography (DLT) is emerging as a critical manufacturing technology for next-generation semiconductor packaging, heterogeneous integration, and advanced substrate fabrication. Unlike conventional mask-based lithography approaches, DLT enables direct imaging workflows capable of supporting extremely fine geometries, rapid design iteration, and large-format substrates such as advanced organic materials and glass panels used in AI-era chiplet architectures.

  As semiconductor devices continue scaling beyond traditional monolithic designs, manufacturers are increasingly adopting 2.5D and 3D heterogeneous integration technologies that combine multiple chiplets into a single high-bandwidth package. These advanced packaging flows require highly accurate data preparation and imaging pipelines capable of preserving geometric integrity throughout the conversion and manufacturing process.

• GDSII Step and Repeat for Wafer Level Mask (Jun 12, 2026)

  GDS-SR is a step and repeat utility designed to take a die (in GDSII format) and step-and-repeat it to create a whole wafer mask.

  The stepping is simple and intuitive and designed to fill in a round wafer with an (optional) flat on the bottom.

  Advanced Mask Functions

  In addition to generating the stepped array, there are several advanced functions incorporate into GDS-SR in order to help a designer produce a complete wafer mask ready for the photo mask shop that does not need further intervention or CAD work.

  This includes the ability to mix multiple die, to remove die and to replace selected die with special devices for alignment or calibration.

• QisMLib - GDSII/OASIS/Gerber/ODB++ Layout Library (Jun 12, 2026)

  QisMLib is a high-performance, multi-threaded CAD library for loading, viewing, processing, and rasterizing electronic design data. Designed for seamless integration into semiconductor manufacturing, PCB production, and EDA software, it provides a simple API that allows developers to work with complex layout data without building and maintaining their own file import and geometry engines.

  The library supports industry-standard formats including GDSII, OASIS, Gerber RS-274X, ODB++, and DXF. Its advanced multi-threaded architecture efficiently utilizes modern multi-core processors to accelerate layout expansion, geometric processing, and bitmap generation while sharing a common memory space.

  A key component of the package is QisMRaster, a high-speed rasterization engine that converts large and complex layouts into high-resolution bitmap images. It is optimized for both small-window analysis and full-panel raster generation involving millions of polygons.

  QisMLib is widely used in applications such as laser direct imaging (LDI), automated optical inspection (AOI), focused ion beam (FIB) systems, digital lithography, inkjet PCB printing, and other manufacturing workflows where reliable, scalable, and high-performance layout processing is essential.