In the demanding manufacturing processes of semiconductors, LED chips, microelectronics, and disk drives, the purity of the fluid is necessary, such as wet etching and cleaning, photolithography and Chemical-mechanical polishing (CMP). With transistors refinement, capturing small particles within the nanoscale, has become increasingly important.
Voir uses e-PTFE membrane as the filtering medium, with superior retention rate and unparalleled flow rate; The gradient pore structure design and graded filtration enable the filter element to have a higher pollutant capacity and longer lifespan. Suitable for manufacturing processes that require strict and repeatable performance, quality consistency, and product cleanliness requirements.