Features:
Applicable to 4, 6, 8 inch wafers (1~3 generation semiconductors)
Precision robotic arm, pick and place accuracy 0.05mm
Highly sealed cavity design, 4pa~10pa
Microwave + quartz gas path design, glue removal uniformity 2~5%
FFU effectively reduces dust pollution
Single reaction chamber, small footprint
High efficiency stripe rate, >40000A/min
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