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Axcelis Technologies

Beverly,  MA 
United States
http://www.axcelis.com
  • 小間番号5821


Full Family of Innovative Ion Implant Solutions

Axcelis Technologies is a global leader in innovative semiconductor manufacturing equipment and services. For over 45 years, chipmakers around the globe have relied on Axcelis’ innovative systems and process expertise. Our goal is to accelerate the pace of innovation in these markets and shape the future of the digital revolution

At Axcelis, we have a single goal: to help semiconductor manufacturers achieve the highest quality and yield, with the lowest cost of ownership. In all that we do, our singular strategy is to align every Axcelis innovation and success with our customers’ goals, strive to understand the entirety of their challenges, and stand ready to deliver the technology, service, and support they need.

We understand that different semiconductor applications pose their own unique ion implantation challenges. We combine industry-leading technical expertise in fab process optimization with the most advanced ion implant technologies to deliver practical solutions tailored to the specialized needs of distinct market segments, including power devices, image sensors, mature process technology, memory and logic devices.

Our Purion product family, our flagship implant platform, includes the Purion H™ series high current, the Purion M™ series medium current, the Purion H200 series medium energy, and the Purion XE™ series high energy implanters. For mature process technology applications, semiconductor manufacturers can rely on Axcelis to provide a full range of 100 to 200mm substrate products designed to add process capabilities and boost your manufacturing capacity. The Axcelis GSD™ Series platform is the industry benchmark for multiwafer implanter productivity. 

 プレスリリース

  • (20231023)
  • (20231023)

 出展製品

  • Purion H Series
    High Current Ion Implanter...

    • The Purion H is Axcelis’ state of the art single wafer high current implanter. The Purion H ushered in
    a new era of yield enabling ion implant technology using enhanced scanned spot beam technology.
    The Purion H was designed to provide customers with an unprecedented level of process control to
    address the modern challenges of the transition to 3D devices.
  • Purion XE Series
    High Energy Ion Implanter...

    • The Purion XE Series single wafer high energy platform combines the process and productivity
    advantages of the RF linear accelerator (LINAC) with the reliability, precision, process flexibility and
    performance of the Purion Platform. The Purion XE Series base system is the Purion XE, and includes
    extended energy range models, Purion EXE, Purion VXE, Purion XEMax. For the power device market,
    Purion XE and Purion EXE Power Series are also available.
  • Purion M Series
    Medium Current Implanter...

    • The Purion M is the only medium current ion implanter for all channel engineering applications in both the
    low and mid dose regimes. The single wafer productivity driven platform covers traditional medium current
    processes, emerging low energy mid dose HALO implants and sub meV well implants. The Purion M is the
    founding member of the Purion Power Series.
  • Purion H200 Series
    Medium Energy Ion Implanter...

    • To address the unique implant needs for devices designed for the Internet of Things (IoT) and power
    applications, Axcelis Technologies has developed the most versatile high current implanter to date.
    The Purion H200 is Axcelis’ state of the art single wafer high current medium energy implanter. The
    Purion H200 provides the user with the industry’s widest energy range on a high current platform with
    energies as low as 10keV up to a maximum single charge implant energy of 230keV. This is achieved
    by combining the efficient beam transport and beam current from Purion H with the post accel
    capability of Purion M. The Purion H200 Power Series has the ability to run high temperature implants
    up to 650°C wafer temperature, providing a unique high current implant solution for SiC power devices.
  • GSD Ovation Series
    Multi Wafer Ion Implanters...

    • For mature process technology applications, semiconductor manufacturers can rely on
    Axcelis to provide a full range of 100 to 200mm substrate products designed to add process
    capabilities and boost your manufacturing capacity. The Axcelis GSD™ Series platform is
    the industry benchmark for multiwafer implanter productivity. The Ovation™ is the latest
    configuration designed to seamlessly integrate into your existing Axcelis multiwafer
    implanters. The Ovation™ extends the GSD series into the future while delivering the highest
    reliability, serviceability, and lowest cost of operations.
    •

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