SVCS Process Innovation

Features and Benefits

• Maintenance friendly mechanical design
• State of the art modular control system, in-house designed and manufactured
• 10,4“ high-res touchscreen for operator interface
• Up to 4 stacked quartz or SiC tube reactor chambers for various procesess
• No thermal interference between different tubes
• Contactless fully automated boat-in-tube loading both cantilever or softlanding configurations
• Independent tube level control system
• HW safety interlocks independent on main CPU
• HEPA or ULPA filtres installed in load station
• Boat elevator and wafer handling automation
• UHP face seal fittings and welds for connections
• UHP orbital weldings made in 100/10 Cleanroom

SVCS Vertical Thermal Reactor (VTR) is designed for all standard atmospheric and low pressure CVD processes. VTR is available with several lengths of flat zone for both mass production and R&D application. The single tube set-up with dual boat logistics is optimized for minimum down time as well as  low maintenance costs.

Features and Benefits

• Automatic wafer handling system for loading wafers from SMIF or FOUP closed pods
• Special automatic loading system which allows loading wafers from open cassettes and provides an exceptionally small footprint
• Quartz or SiC boats can be used 
• Highly tailored state of the art modular control system, in house designed and manufactured
• 10,4“ high-res touchscreen for operator interface 

Features and Benefits

• Ideally suited for R&D labs and pilot fabs
• Small footprint
• Table or standalone solution (with stands)
• Stackable desing (e.g. double tabletop variant)
• Low power consumption
• Easy operation and maintenance
• Heating element with 1 or 3 temperature zones and max. temperature up to 1300 °С
• Modern modular proprietary control system
• Up to 8 gas lines and 2 liquid sources
• Independent hardware safety interlocks
• Integration of vacuum pump systems in cooperation with leading pump manufacturers

| Temperatures up to 2000°C

| Hermetically sealed loading area

| Controlled atmoshpehe loadlock chamber

| Vacuum processes

| Touchscreen operator interface placed on cleanroom wall

| Automatic wafer handling system for loading wafers

| Unique temp. measurement by spike and profiling TC combine with pyrometry

| 7 independent water cooling circuits with the flow rate and temp. monitoring