ELIONIX

Booth: E4628

「ナノテクノロジーの発展と共に歩んだ50年から、未だ見ぬ小さな世界に挑戦し続ける50年へ」

2025年、創業50周年を迎えるエリオニクスは、ナノテクノロジーと共に進歩し続けてきました。1975年、創業者である7人の技術者が掲げた「時代をリードする創造企業を目指し、科学技術の進歩に貢献する」の志を礎に、その時代ごとに世界最小の線を描ける電子線描画装置を生み出すなど、現在も革新と挑戦を重ねています。

本展示会のブースでは、50年の歩みを振り返る動画や歴史を引き継いだ以下の最新装置をご紹介いたします。

業界トップシェアを誇ってきた電子ビーム描画装置を一新し、パワーアップして生まれ変わった【ELS-BODEN】をご紹介致します。見た目はもちろんの事、加速電圧・チャンバーサイズ・搬送機構・除振台を用途や環境に合わせて選択できるモジュールシステムや新規設計した偏向系によるスループットの向上、ユーザーフレンドリーな新ソフトウェアなど、たくさんの見どころを是非この機会にご確認下さい。

さらに、R&D向け電子ビーム描画装置の最新エントリーモデルである【ELS-ORCA】やElectron Cyclotron Resonance (ECR) 方式のイオンビームを用いたエッチング/スパッタ装置【EIS-1500】【EIS-220】、ナノインデンテーションテスターの【ENT-5】もご紹介いたします。

EBLからエッチング・成膜まで一連のプロセスのご相談もお受けしておりますので、是非弊社ブースへお立ち寄り下さい。

Press Releases

(20251120)

Products

Electron Beam Lithography System ELS-BODEN

Unmatched Versatility in Nanofabrication Acceleration voltages are available at 50, 100, 125, and 150 kV - selectable to match your application needs.... More Info Less Info

8” and 12” Lineup

World’s first full 12” exposure capability. Supports sizes from small pieces, often used in R&D, to 2, 3, 4, 5, 6 , 7, 8, and 12 inch wafers as well as mask blanks in 6025 and 9025 size.

Automatic Loading System

Single autoloader, suitable for R&D applications, multi autoloader, for low-volume to middle-volume production and robot loader are available depending on your needs.

Simple GUI Software

New software “elms” is included as standard with the lithography system. Since each of the packages, CAD conversion, beam adjustment, exposure, and SEM observation, is independent, it makes the program intuitive and your workflow more efficient. Access to each function can be restricted for different users by using account management function.

Electron Beam Lithography System ELS-ORCA

Precision within Reach Cutting-edge performance on a customizable 30 kV platform tailored for R&D applications.... More Info Less Info

Various Options, Tailored Specifications

The ELS-ORCA is the 30 kV electron beam lithography system which can be customized with various options such as the 50 kV acceleration voltage, dynamic focusing/stigma, and the height sensor assist focus adjustment. With a combination of these options, the ELS-ORCA becomes a tailored system that meets individual requirements of researchers.

User-friendly Software

The new machine control software "elms" is preinstalled onto the ELS-ORCA system. The elms is a comprehensive suite of modules such as CAD data conversion, beam adjustment, exposure, and SEM observation. This modular system makes necessary functions more reachable and your workflow more productive. The account management function of the elms can restrict the accessibility to functions depending on users.

Retarding Option for SEM Imaging

The retarding option of the ELS-ORCA allows for low-damage/high-resolution SEM observations. With its low acceleration voltage equivalent to SEM system, the ELS-ORCA enables you to observe up to 6-inch area for 8-inch wafers. Automatic SEM observation using CAD data prepared for exposure is also available.

ECRイオンビームエッチング装置　EIS-1500

Φ108 mm の大口径ビーム！ビーム面内分布モニタリング機能を駆使した、異方性ドライエッチングが可能。... More Info Less Info

微細加工に最適

ECRプラズマは、低ガス圧の環境下で生成されるため直進性の高いビームを引き出すことができます。大量の低エネルギーイオンを加速して、より高真空な試料チャンバー内に導いて加工します。ナノオーダーのエッチング加工に最も適したシステムです。

PCによる操作の簡略化と自動化

オペレーターの負荷を軽減するための自動スケジュール機能、レシピ機能など快適なオペレーション環境を提供します。

低ダメージエッチング

プラズマ生成条件設定、ビーム加速電圧設定などに加え、ビーム面内分布モニタリング機能を駆使することで、レジストへのダメージを最小限に止め、選択比の大きい加工条件が得られます。

ECRイオンビームスパッタ装置　EIS-220P

2本のイオン銃を搭載！２本のイオン銃で真空を破ることなくエッチングと成膜を繰り返し行うことが可能。... More Info Less Info

２本のイオン銃を搭載

2本のイオン銃をエッチング用と成膜用に使い分けることで、サンプルをチャンバー内から取り出すことなく、真空状態を維持したままエッチングと成膜を交互に繰り返し行うことが可能です。

イオンビーム照射角度調整

サンプルステージの角度を調整することで、サンプルに対するイオンビーム照射角度を変更することができ、所望の角度に制御した斜めエッチングが可能です。

不活性ガス、活性ガスが使用可能

Ar、Xe などの不活性ガスに加え、O₂ や CF4 などの活性ガスもイオンソースとして適用できるため、反応性エッチングも可能です。

Nanoindentation tester ENT-5

A nanoindentation tester that delivers high data reproducibility by minimizing disturbances in the measurement environment.... More Info Less Info

Applicable to variable kind of materials

・Thin film materials such as plating and hard films
・Resin materials, film materials
・Extremely thin film such as DLC
・Functional resin film and surface modification film
・Microparticles and powder materials

Features of ENT-5

・5th generation “ENT”
・High data reproducibility by suppressing disturbance in the measurement environment
・Because it is made in Japan, it has a friendly GUI.
・Supports a wide range of test loads from 0.5 μN to 2,000 mN

Nanoindentation test

・Mechanical properties such as hardness and elastic modulus of thin films, extreme surfaces, and minute regions can be obtained.
・Indentation observation is not required because the characteristics are obtained by analyzing the load-displacement curve.
・Compliant with ISO 14577-1/JIS Z 2255

Data reproducibility and maintainability

1, Temperature control mechanism
・Suppresses thermal expansion of samples and testing machines
・Temperature control inside the windshield at ±0.1℃
・Low thermal expansion material (nobinite) is used for measuring parts.
・Blocks the influence of external air currents

2, High precision positioning stage
・Adopted high-precision stage technology for electron beam lithography equipment developed in-house
・Positioning possible in 0.1μm steps
・Measuring any location with an observation magnification of 2,000x (when using a standard objective lens of 20x and digital zoom)

3, Anti-vibration mechanism
・High-precision wedge-shaped stage that is resistant to vibration
・Equipped with an active anti-vibration table as standard

4, Software
・Auxiliary functions such as indenter tip correction, temperature drift correction, and reminders for daily inspection
・ Operability cultivated through many years of experience

5, Data reproducibility
・Data reproducibility is improved with a mechanism that suppresses the effects of disturbances such as vibration and temperature changes.
・Stable data acquisition is possible even in continuous measurement

6, Maintainability
・Easy replacement of high load unit and low load unit
・Equipment downtime is reduced by calibrating equipment by exchanging units.

Load unit

High load unit measurement example [Fused quartz]
(Test load: 100μN 9 times overlapping)

Low load unit measurement example [Resist]
(Test load: 1μN 9 times overlapping)

▶ High load unit
・Testing from 5 μN to 2 N is possible.
・Compatible with hardness tests for a wide range of materials, from metallic materials to polymeric materials.

▶ Low load unit
・Corresponds to 0.5 μN to 10 mN.
・Soft materials (elastic modulus: several GPa or less) and
Excellent repeatability and stability can be obtained for measurements with an indentation depth of 10 nm or less.
・Functional resins such as UV curable resins, low-k films, elastic materials such as silicone rubber, and ultra-thin hard films such as DLC films
Suitable for mechanical property evaluation.