We welcome you to our booth (East Hall 5, Booth E5616)
We pioneered the import, installation, and replacement of high-pressure gases for ion implantation in Japan in 1969. We are now the only company in Japan to offer domestically produced products, manufacturing, selling, and servicing our proprietary adsorption-type negative pressure gas source (T-ion™). We look forward to welcoming you at our booth (East Hall 5, Booth E5616).
■T-ion TM Sub-atmospheric Source Gas: We are the only domestic manufacturer launches production and sales of Adsorption-Type Negative Pressure Gas Ion Implantation Source (T-ionTM) in 2021. We also have jigs ready that enable quick replacement of imported negative pressure gas sources with T-ionTM. Our main lineup of gases includes AsH3, PH3, 11BF3, GeF4, 72GeF4, SiF4, PF3, and Xe. For gas types other than those listed above, we will consider your requests upon consultation.
■Toxi Capture™: A micro-decontamination system that removes minute amounts of toxic gases, providing a simple solution for reducing toxic gases. Developed by Takachiho and patented worldwide.
■Excimer Laser Gas: Since 1997, we have been selling F2 mixed gas for excimer lasers. We also manufacture mixed gases using neon sourced through our own unique procurement channels worldwide. We can produce gas mixtures tailored to your desired concentration. Please contact us for consultation. (Kr/Ne, Ar/Kr/Ne, Xe/Ar/Ne, F2/Kr/Ne, F2/Ar/Ne, Xe/Ne, HCl/H2/Ne)
■72GeF4 (72-Enriched Tetrafluoride Germanium): 72Ge has a high natural abundance ratio. 72GeF4 increases the concentration of this 72Ge, contributes to improved manufacturing throughput. Furthermore, selecting 72Ge eliminates the impact of arsenic contamination.
■11BF3 (11 Enriched Boron): As the only domestic company with stable supply from multiple sources.
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