- Multi-purpose ultra-purity metal films manufacturing system by strictly controlling the film
properties such as logic, memory application & advanced package in semiconductors
- A flexible system for mixing and matching chambers to apply multi-step
process sequence
- Demonstrates high reliability and provides more CoO benefits
- Feature & Properties
- Wafer Size: 12“(300mm) & 8”(200mm)(6”available)
- Tandem(or Single) octagonal cluster system
- Standard Configuration: EFEM(VCE for 8/6”) + LL + Transfer + Degas + Preclean(Etch) + Process
Detailed System Configuration depends on the applied process
- Uniformity(Film/Etch): ≤ 3%(depends on THK) for film, ≤ 5% for preclean