NIVERSAL ULTRA Multi-wave Hybrid Technology Laser Machine × Semiconductor Industry Application
As semiconductor manufacturing processes increasingly pursue high precision and low loss, the UNIVERSAL ULTRA laser cutting and engraving machine has become an indispensable tool in fine processing with its world's only technology for simultaneously irradiating three laser beams for processing.
Technical Features: The world's first MultiWave Hybrid™ multi-wave hybrid technology
The ULTRA series is equipped with patented MultiWave Hybrid™ technology. The system provides three laser wavelengths (10.6 μm, 9.3 μm, 1.06 μm), which allows any combination of laser wavelengths to be focused to the same focal point in the same focal plane and used simultaneously or sequentially.
🔷 Wider laser material processing capabilities
The dual laser function provides more than seventeen times the number of laser configurations as a single laser system. Each unique combination of laser power and wavelength provides users with additional options to configure the best laser processing solution for their application.
● Laser cutting of carbon fiber reinforced plastics: 1 x 75W 10.6µm laser and 1 x 50W 1.06µm laser
● Laser cutting of multi-material laminates: 1 x 50W 10.6µm laser and 1 x 50W 1.06µm laser
● Rapid prototyping for flexible circuit manufacturing: 1 x 75W 10.6µm laser and 1 x 30W 9.3µm laser and 1 x 50W 1.06µm laser
● Selective laser etching of thin film materials: 1 x 50W 10.6µm laser and 1 x 50W 1.06µm laser
● Laser cutting of silicon wafers: 1 x 75W 10.6µm laser and 1 x 50W 1.06µm laser
🔷 Wide range of material adaptability

Laser Cutting Delrin™ with a 10.6 µm CO 2 Laser

Kapton™ laser cutting, drilling and marking using 9.3 µm CO 2 lasers

Stainless steel marked with a 1.06 µm fiber laser
🔷 Highest productivity and reduced costs
MultiWave Hybrid™ technology allows users to select the ideal laser wavelength and power for the material they are processing. The laser can be installed in seconds without special training and tools. The ideal laser wavelength and power can be selected for each application, and there is no need to purchase a new laser system for each new application, thus reducing costs.
🔷 Achieve higher precision
Combined with High Power Density Focusing Optics (HPDFO)™, the laser precision is taken to a higher level - cutting accuracy of ±0.1 mm, engraving accuracy of up to 2000 DPI, and can process extremely small sizes and complex geometric structures to meet the needs of increasingly miniaturized semiconductor components.
Why choose ULTRA for semiconductor processing?
Short pulse, small heat impact:
In wafer cutting, drilling and microstructure processing, short pulse lasers can significantly reduce the heat affected zone, avoid material deformation and micro cracks, and ensure stable quality of finished products.
High-precision and non-contact processing:
Compared with traditional mechanical processing, laser processing has no stress contact and is not prone to particle contamination. It is particularly suitable for processing thin film material laser etching, wafer marking, packaging drilling and other high-demand processes.
Strong material compatibility:
From thin film materials, silicon wafers, engineering plastics, engineering composite materials, etc., ULTRA can switch the corresponding wavelength according to the material to optimize the processing effect.
🌍 UNIVERSAL's cross-industry application advantages are widely used in:
✅Electronic technology
✅Aerospace manufacturing
✅Automotive industry
✅Medical equipment
✅Battery manufacturing
✅Architectural models
✅Art creation
From high-end industry to innovative design, ULTRA lasers are key tools for achieving efficient, precise and automated processing.