TSI INCORPORATED

• Nanoparticle Monitoring in Ultrapure Water — TSI Nano LPM™ System for true 10 nanometer (nm) nanoparticle detection in semiconductor ultrapure water (UPW)
• Parts Cleanliness Testing — Ensure reliability with precise cleanliness evaluations down to 2 nm
• Particle Detection in Hugh-Purity Gases — Reliable and repeatable measurements down to 2 nm
• Airborne Particle Monitoring in Cleanrooms — Advanced systems for monitoring airborne particles as small as 10 nm
• Vapor Delivery Solutions — Optimize thin-film deposition with our advanced Direct Liquid Injection (DLI) tools
• Particle removal efficiency (PRE)Calibration Standards — Support for surface scanning and inspection tool calibration down to 10 nm
• CMP Slurry Analysis — Gain single-particle insights for precise slurry size distribution.
• PRE Challenge Wafers — Validate particle removal efficiency with confidence.

Visit us to explore our advanced solutions for precision, quality control and reliability in semiconductor manufacturing to ultimately increase yield.

Nano LPM™ System

TSI Nano LPM™ System detects true 10 nm nanoparticles in ultrapure water (UPW), offering continuous, real-time monitoring. It supports semiconductor cleanroom processes with patented technology for reliable particle detection and UPW quality control.... More Info Less Info







The TSI Nano LPM™ (Liquid Particle Monitor) System delivers true 10 nm nanoparticle detection in ultrapure water (UPW), essential for advanced semiconductor manufacturing. 

Using a patented aerosolization technique, UPW is transformed into droplets, dried, and solid particles are isolated. These particles are then measured by a water-based Condensation Particle Counter (CPC), designed for cleanroom compatibility. 

The Nano LPM ensures real-time, continuous monitoring of UPW, enabling early detection of contamination events and process anomalies. Engineering and quality teams gain reliable data to support quick, informed decisions. With consistent performance and high sensitivity, the Nano LPM™ sets the standard for UPW particle monitoring in nanometer-scale process environments.



General Scanning Mobility Particle Sizer (SMPS™)

The SMPS™ 3938 spectrometer provides high-resolution size distribution data for submicron aerosols from 1 nm to 1 µm. Modular and customizable, it offers precise nanoparticle measurements for research and process monitoring.... More Info Less Info







The TSI SMPS™ 3938 (Scanning Mobility Particle Sizer) spectrometer accurately measures size distributions of airborne nanoparticles from 1 nm to 1 µm. Using electrical mobility sizing and single-particle counting, it delivers high-resolution data across up to 384 size channels. 

The modular system allows full customization, with a choice of four Differential Mobility Analyzers (DMAs), six Condensation Particle Counters (CPCs), and two neutralization methods to suit a wide range of research or industrial needs. For extended measurement capabilities, the SMPS™ can be paired with an Optical Particle Sizer (OPS) or Aerodynamic Particle Sizer (APS) to measure particles up to 10 µm or 20 µm, respectively. 

Engineered for flexibility, precision, and performance, the SMPS™ 3938 is ideal for nanoparticle research, air quality studies, and advanced material characterization.



AeroTrak™ Portable Particle Counter 9110

The TSI AeroTrak™ 9110 Portable Particle Counter detects particles as small as 0.100 µm using patented HeNe laser tech. Ideal for ISO Class 1–2 cleanrooms, it supports real-time monitoring, onboard reporting, and system integration.... More Info Less Info







The TSI AeroTrak™ Portable Particle Counter Model 9110 provides highly accurate particle detection down to 0.100 µm, enabled by patented, low-maintenance HeNe laser technology with an enhanced signal-to-noise ratio. Designed for demanding environments, it is ideal for ISO 14644-1 classification of Class 1 and 2 cleanrooms, cleanroom and process tool monitoring, and filter testing. 

The Model 9110 supports pass/fail reporting with an onboard printer and comes with TrakPro™ Lite Secure software for data download. Users can store and upload multiple configurations with ease. This versatile unit functions as a standalone device or can be integrated into a facility monitoring system, such as TSI’s FMS 5. The 9110 meets ISO 21501-4 requirements and is calibrated with NIST-traceable PSL spheres using TSI’s high-precision Classifier and Condensation Particle Counters, ensuring reliability and compliance in critical environments.



Turbo II™ Vaporizers

MSP Turbo II™ Vaporizers use advanced droplet atomization and Direct Liquid Injection (DLI) to deliver up to 200% more vapor output in half the size. Ideal for thin film processes, they improve yield, reduce downtime, and handle challenging precursors.... More Info Less Info







MSP Turbo II™ Vaporizers are engineered using cutting-edge droplet atomization science and a Direct Liquid Injection (DLI) method to meet the evolving demands of modern vaporization applications. 

With a compact design—just half the size of previous models—they deliver up to 200% more vapor output. This performance boost enables stable, uniform vapor delivery, leading to higher-quality thin films and improved wafer yields in semiconductor manufacturing. The clog-resistant design ensures precise control and allows the use of challenging precursors that were previously incompatible, unlocking new process possibilities. The result is extended, stable operation with reduced maintenance, less downtime, and significant cost savings for users. 

MSP Turbo II™ Vaporizers set a new standard for reliable and efficient vapor delivery in advanced material processes.



Turbo™ Liquid Flow Controller

The MSP Turbo™ Liquid Flow Controller (LFC) delivers precise, reliable liquid control for CVD, PECVD, ALD, and MOCVD processes. It features integrated flow metering, smart control electronics, and optional piezo valve for vaporizer compatibility.... More Info Less Info







The MSP Turbo™ Liquid Flow Controller (LFC) is engineered for high-precision liquid delivery in advanced semiconductor processes such as CVD, PECVD, ALD, and MOCVD. 

Designed for accuracy and ease of use, the Turbo™ LFC integrates a high-performance liquid flow meter with intelligent control electronics to ensure stable and repeatable flow rates. This enables tight process control and enhanced film quality in thin-film deposition applications. For added flexibility, an optional external piezo valve accessory is available, making the system compatible with a wide range of vaporizer technologies. With its compact design and robust performance, the Turbo™ LFC offers the reliability and control needed for today’s demanding manufacturing environments.



Vapor Process Gas (VPG) Filters

Engineered for low-pressure, high-temperature use, these filters offer reliable performance with chemically aggressive gases. Featuring ultra-low pressure drop, they enable faster pump down and improved efficiency in vacuum and clean process systems.... More Info Less Info







Designed for low pressure and high temperature applications, providing reliable filtration even for chemically aggressive vapors/gases. The filters are designed to have extremely low pressure drops, making it easier to work in an ultra-low pressure environment. Pump down is faster, and lower pressures are possible.