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Kyzen Corporation

  • Booth: I2423

KYZEN Cleaning Experts On-site at Booth #I2423 Hall 1

Overview

KYZEN has been pioneering award-winning environmentally responsible advanced cleaning technologies since 1990 by fusing our commitment to groundbreaking science in cleaning chemistries and research with the care we have for your manufacturing cleaning process and your success. That means we continuously improve our cleaning agents and problem solve to create the most effective cleaning products and solutions to suit your specific needs. And, we are meticulous in our attention to detail in meeting those manufacturing cleaning needs, tackling it head on and sticking with it until it is successfully resolved.


  Press Releases

  • With the explosive growth of Artificial Intelligence (AI) applications, semiconductor packaging technology is undergoing unprecedented transformations. In advanced packaging processes such as CoWoS and CoPoS, heterogeneous integration and extreme miniaturization render internal structures incredibly complex. The adoption of large die sizes and 3D stacking technologies, combined with micro-gap spaces, has drastically elevated the difficulty of the cleaning process.

    Within these highly precise processes, residual flux has become a critical challenge threatening product reliability. Inadequate cleaning can easily trigger electrochemical migration, leakage currents, or even component failure. Facing these stringent cleaning bottlenecks, KYZEN Corp, a pioneer dedicated to eco-friendly and high-efficiency cleaning agents, stands as your most reliable technical ally.

    We cordially invite you to visit the KYZEN booth at SEMICON Taiwan. We look forward to discussing the latest flux cleaning technologies with you and showcasing our innovative solutions engineered specifically for advanced AI processes, ensuring your products meet the highest reliability standards.

    The KYZEN Team


  Products

  • MICRONOX® MX2708
    Organic Acid Residue Cleaning Agent...

  • MICRONOX MX2708 is formulated for the demanding cleaning challenges presented within leadless devices such as low standoff gaps and fine pitches of Cu Pillar flip chips, 2.5D/3D ICs, SiP and AiP. MX2708 completely removes organic acid residue of all kinds at low, safe operating concentrations all while having no effect on exposed metal and intermetallic alloys including Cu, Al, Sn, Pb, Ni, Ag, and Au finishes. MICRONOX MX2708 most effectively cleans organic acid flux residues at lower concentrations in spray-in-air cleaning systems.

    • Effectively Cleans Under Highly Dense Die Without Reacting with Exposed Metals
    • SAC, Aluminum and Copper Safe
    • Low Surface Tension
    • Superior Rinsing Ability
  • MICRONOX® MX2060
    Advanced IC Substrate Cleaner...

  • MICRONOX MX2060 is a cleaning agent designed for leave-in flux. It effectively removes stubborn flux residues left over from lead-free soldering processes at low usage concentrations. With a perfectly balanced formula that removes flux residue while removing metal oxides, it provides long-lasting metal protection against re-oxidation after cleaning. MX2060 is suitable for in-line spray cleaning systems to clean products after lead-free soldering processes, such as IC carrier boards, electronic assemblies, etc. The flexible process parameter window provides users with a low-cost, efficient cleaning solution.

    • Effective on Tough NC Flux Residues
    • Superior Cu De-Oxide and Long-Term Protection
    • Low Operation Concentration
    • Wide Process Window

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