光焱科技股份有限公司

PD-RS Photoelectric Device Response Measurement and Analysis System

The PD-RS is engineered for the optoelectronic characterization of photodetectors and photonic devices. A monochromatic single-wavelength laser source, driven by continuous-pulse or periodic intensity modulation, illuminates the device under test and excites photocurrent or photovoltage signals that the system captures for both time-domain and frequency-domain analysis.

Together these measurements give a complete picture of photoelectric conversion performance: frequency response from 10 Hz to 30 MHz, rise and fall time, linear dynamic range spanning up to nine orders of magnitude, and transient photocurrent and transient photovoltage behavior.

The laser source achieves rise and fall times below five nanoseconds, so the instrument can resolve the fastest response limits of a device and support meaningful TPC and TPV studies of carrier transport and recombination in thin-film structures.

Automated software sweeps the modulation frequency, plots the response curve, and extracts the minus three decibel cutoff point, the standard marker of device speed. Linear dynamic range testing maps photocurrent against incident light intensity across a 120 decibel window and derives the responsivity in milliamps per watt, a parameter widely used to judge photodetector quality.

Four selectable laser modules are available: RS-405 at 405 nm, RS-520 at 520 nm, RS-633 at 633 nm, and RS-940 at 940 nm. The platform is applicable to Final Test stage measurement in semiconductor production.

By closely correlating carrier transport, recombination, and dynamic behavior with intrinsic material properties and device architecture, the PD-RS supplies dependable data for device evaluation, performance optimization, and the development of new photoelectric materials.

 

PD-RS 光電元件響應測量與分析儀

PD-RS 專為光電元件（Photodetector）及各類光電器件的光電轉換特性分析而設計。系統以單色（單波長）雷射光源為核心，搭配連續脈衝或週期性光強調制照射待測元件，激發其產生光生電流（Photocurrent）或光生電壓（Photovoltage）訊號，並同步進行時域（Time Domain）與頻域（Frequency Domain）的量測與分析。

這些量測共同構成完整的光電轉換能力評估：頻率響應涵蓋 10 Hz 至 30 MHz、Rise Time / Fall Time、光強線性度（Linear Dynamic Range）最高可達 9 個量級，以及瞬態光電流（TPC）與瞬態光電壓（TPV）的動態行為。

系統雷射光源具備高速調變能力，爬升與下降時間低於 5 ns，因此能解析元件最快的時間響應極限，並支援薄膜光電元件中載子傳輸與復合行為的 TPC / TPV 研究。

軟體可自動調製輸出光束的調變頻率、繪製頻率響應圖，並擷取 −3 dB 截止頻率——當調變頻率上升至裝置響應跟不上光源開關變化、響應光電流隨之下降至 −3 dB 強度時，該頻率即作為標記元件速度的性能指標。光強線性度測試則在 120 dB 動態範圍內描繪光電流與入射光強度的對應關係，並換算出響應度（mA/W），為業界廣泛用於表徵光電元件優劣的參數。

系統提供四種可選雷射模組：RS-405（405 nm）、RS-520（520 nm）、RS-633（633 nm）、RS-940（940 nm）。平台可應用於半導體製程中的 FT（Final Test）測試階段。

透過將載子傳輸、復合及動力學行為與材料本質特性、器件結構緊密關聯，PD-RS 為光電元件的特性評估、性能優化及新材料開發提供可靠的量測依據。

Enlitech's APD-QE is a quantum efficiency platform for micron-scale APDs and miniature photodetectors, FT-ready, 300–2500 nm.

Bottlenecks: an oversized spot lets photons overflow the active area yet still be counted, underestimating EQE; focus drifts with wavelength, folding optical error into the curve; and since the source spectrum sets intensity, each wavelength sits at a different gain point.

Falcon dual modes: Spot-Viewer pairs Köhler illumination with apochromatic objectives (10X/20X/100X) for a sub-5 μm spot matching 10–200 μm active areas, with imaging for visible alignment. Irradiance Mode uses an ASTM E1021 uniform field (>99% uniformity), removing offset and dispersion errors. Both share one platform and integrate with probe stations.

PEM: 2,000-step modulation across five decades, with automated constant photon flux holding identical injection at every wavelength.

Measures EQE, spectral response, I-V, NEP, D* and noise-current frequency response (flicker, Johnson, shot).

 

APD-QE 是光焱科技 Enlitech 專為微米級雪崩光電二極體（APD）與微型光電探測元件開發的精密量子效率量測平台，可導入晶圓後段 FT 階段，於 300–2500 nm（可客製）提供具計量基礎的光譜表徵數據。

微米尺度量測的三項瓶頸

一、光斑與對位：傳統單色儀的聚焦光斑大於元件感光區，溢出光子未被吸收卻仍計入入射通量，使 EQE 系統性偏低；偏差隨面積比變化，不同尺寸元件數據無法橫向比較。缺乏影像回饋時只能盲對，離散度難以歸因。

二、色散與像差：聚焦光路的焦點位置與光斑尺寸隨波長改變，掃描時光斑漂移縮放，曲線混入光學系統自身的波長相依偏差。

三、光強依賴性：APD 等高靈敏元件響應呈非線性，內部增益對光注入條件敏感。傳統模式下各波長光強由光源光譜分佈決定，元件在不同波長處於不同增益工作點，各數據點彼此不可比。

Falcon 雙精密量測模式

Falcon-Spot-Viewer 模式：顯微光學引擎、Köhler 照明與平場複消色差物鏡（10X/20X/100X）將光斑壓縮至實測小於 5 μm，直接對應 10–200 μm 感光區。內建影像視野使對位可視化，量測前即可確認光斑落於感光區內。

輻照度模式：自主研發的光束空間均質化技術以大面積均勻光斑取代聚焦光斑，符合 ASTM E1021，10 mm×10 mm 不均勻度低於 ±5%、5 mm×5 mm 低於 ±1%，均勻度達 99% 以上。均勻照明下位置微偏不影響結果，並排除色散與像差誤差。

兩模式共用軟體平台，切換無須更換硬體或重新校正，可與各式先進探針台整合。

PEM™ 光子能量調變器

2,000 階高解析度調變、衰減範圍跨越 5 個數量級；內建智慧光子通量計算與自動控制，依實測光源光譜求解衰減量。恆定光子通量模式於全波段維持設定通量，使響應隨光強變化的元件在各波長處於相同注入條件，光譜數據具可比性。P 偏振模組支援線偏振光源，可進行偏振相依分析。

綜合量測能力

單一平台完成 EQE 光譜、光譜響應（SR, A/W）、I-V 特性曲線（暗電流／光電流）、NEP 光譜、D* 光譜、雜訊電流頻率響應，以及閃爍雜訊、約翰遜雜訊與散粒雜訊分析。EQE 與 SR 描述光電轉換效率，NEP 與 D* 量化可分辨的最小光訊號；雜訊頻譜分析可區分低頻主導的閃爍雜訊、與偏壓及溫度相關的約翰遜雜訊，以及源自載子離散性的散粒雜訊，據以釐清限制靈敏度的物理機制。

FireFox-1310: High-Power Silicon Photonics Burn-In Test System

As silicon photonics scales up, industry leaders like NVIDIA are adopting one-to-many channel (MRM) architectures. Once light is split across channels, conventional 26 dBm sources can no longer deliver sufficient aging stress—stretching PIC burn-in cycles from days to weeks and squeezing the golden window for process tuning and tape-out.

FireFox-1310 is more than a laser source. It's a high-performance 1310/1311 nm CW laser system with active power and polarization control, purpose-built for photonic integrated circuit (PIC) burn-in and reliability testing—supporting WAT, CP, and FT applications.

Key advantages:

• Programmable power with real-time feedback lock — set your target power once; the system compensates automatically for drift, enabling true 24/7 unattended aging tests with zero drift.
• Full-range polarization control — motorized polarization controller reaches any state of polarization (SOP) on the Poincaré sphere, with ~0.25° angular and ~0.20° ellipticity resolution—critical for polarization-sensitive PICs.
• Real-time power & insertion loss monitoring — built-in high-precision power meter with automatic logging for full traceability.
• Ultra-low insertion loss, high output — typical output exceeding 1W via low-loss FC/APC connectors, delivering maximum power directly to the DUT.
• Industrial-grade reliability — fan-cooled design engineered for continuous, unattended 24/7 operation.

With >30 dBm max output, FireFox-1310 reclaims up to 3 months of tape-out timeline by solving the power, drift, and polarization bottlenecks that limit legacy burn-in systems.

 

FireFox-1310：高功率矽光子燒機測試系統

隨著矽光子產業快速上量，NVIDIA 等領先廠商全面採用一對多通道（MRM）架構。光源經過分光後，傳統 26 dBm 設備已無法提供足夠的老化應力，導致 PIC 燒機測試（Burn-in）週期被迫從天數拉長至數週，嚴重壓縮製程調整與流片（Tape-out）的黃金窗口。

FireFox-1310 不僅僅是傳統的雷射光源——它是一款高性能、具備主動功率與偏振控制的 1310 nm／1311 nm 連續波（CW）雷射系統，專為光子積體電路（PIC）的老化與可靠性測試而設計，適用於 WAT、CP、FT 應用場景。

關鍵優勢：

• 可程式化功率＋即時回饋鎖定——只需設定一次所需功率，系統便自動補償任何波動，實現真正零漂移的 24/7 全天候無人化老化測試。
• 全範圍偏振控制——電動偏振控制器可即時完整控制 Poincaré sphere 上任意偏振狀態（SOP），角步進解析度約 0.25°、橢圓度步進解析度約 0.20°，對偏振敏感的 PIC 元件至關重要。
• 即時功率與插入損耗監控——內建高精度功率計，並自動記錄數據，為整個測試過程提供完整追溯性。
• 極低插入損耗＋高輸出功率——典型輸出功率超過 1W，透過低損耗 FC/APC 接頭，將最大光功率直接傳輸至受測元件（DUT）。
• 工業級穩定可靠性——氣冷式設計，專為生產現場 24/7 不間斷運行打造。

FireFox-1310 最大輸出功率超過 30 dBm，一舉解決傳統設備在功率、漂移與偏振控制上的瓶頸，為下一次流片搶下最多 3 個月的黃金窗口。

ProbeInsight® Series NightJar™ — Silicon Photonics Wafer Test Solution

NightJar™ is Enlitech's advanced wafer-level testing system engineered to maximize yield in silicon photonics manufacturing. Built on a standard wafer test platform, it enables rapid, full-wafer optical loss imaging before formal measurement—revealing die-level and even sub-die-level insertion loss in real time.

Key Capabilities:

• Seamless Integration — Compatible with all major probe stations and test instruments, supporting wafer sizes from 4" to 12"
• Defect Mapping — Accelerates defect localization and process analysis for fast identification of chip-level issues
• Pre-Package KGD Screening — Precisely identifies Known-Good-Die (KGD) to ensure packaging yield and reliability
• Rapid Optical Loss Analysis — Delivers comprehensive qualitative and quantitative optical parameter testing

The NightJar Advantage:
By enabling fast screening and problem localization, NightJar helps R&D teams pinpoint design or process issues faster, while preventing production teams from wasting valuable IL/PDL test time on defective die. In a direct comparison across 64 dies, traditional IL mapping took 123 minutes and could only report overall IL values—without identifying loss location or root cause. NightJar completed the same mapping in just 121 seconds, while also identifying the dominant loss source (e.g., MRM) and visualizing spatial distribution to support rapid decision-making.

NightJar supports high-throughput wafer-level inspection, significantly shortening R&D cycles and improving production efficiency—making it an essential tool for silicon photonics yield optimization.

 

ProbeInsight® Series NightJar™ — 矽光子晶圓測試系統

NightJar™ 是光焱科技研發的先進晶圓級測試系統，專為最大化矽光子製程良率而設計。此系統建構於標準晶圓測試平台之上，可在正式量測前快速掃描整片晶圓，即時顯示每顆晶粒（die）乃至次晶粒（sub-die）層級的光損耗影像。

核心優勢：

• 無縫整合 — 相容於所有主流探針站與測試儀器，支援 4 吋至 12 吋晶圓
• 缺陷映射能力 — 加速缺陷定位與製程分析，快速辨識晶片問題
• 封裝前已知良品晶粒篩選 — 精準篩選已知良品晶粒（KGD），確保封裝良率與可靠性
• 快速光學損耗分析 — 提供光學參數的全面定性與定量測試

NightJar 的關鍵價值：
透過快速篩選與問題定位，NightJar 協助研發團隊更快找出設計或製程問題，同時讓量產端避免將寶貴的 IL/PDL 測試時間耗費在不良晶粒上。以 64 顆晶粒的實測比較為例：傳統 IL 映射需耗時 123 分鐘，卻僅能得知整體 IL 數值，無法得知損耗位置或原因；而 NightJar 映射僅需 121 秒即可完成，並能識別主導損耗來源（如 MRM），同時呈現空間分布，輔助快速決策。

NightJar 支援高產能晶圓級檢測，有效縮短研發週期、提升產線效率，是矽光子良率優化不可或缺的關鍵工具。