Plasma Cleaning System 為半導體、電子及先進封裝製程的重要前處理設備,結合**RF Plasma(射頻電漿)與Microwave Plasma(微波電漿)**兩大技術,可依不同材料及製程需求提供最佳清潔與表面改質方案。
RF Plasma Cleaning System主要應用於晶圓、基板及封裝材料的表面清潔與活化,可有效去除有機污染物、微粒及殘留物,提高材料表面能,增強Die Bonding、Wire Bonding及Underfill等製程的接著強度與可靠性,並具備高均勻性、高產能及低損傷等優勢。
Microwave Plasma Cleaning System則適用於去除氧化層、光阻(Photoresist)、聚合物殘留及微量有機污染物,具備高密度電漿、非破壞性清潔及優異去氧化能力,可提升後續鍍膜、鍵合及封裝品質。
產品提供Batch Type、Stand-alone及Inline全自動設備,可依產線需求彈性配置,廣泛應用於先進封裝、HBM、CoWoS、Fan-Out、Power Semiconductor、MEMS、Lead Frame及PCB等製程,協助客戶提升製程穩定性、生產效率與整體良率。
Plasma Cleaning System provides advanced surface cleaning and activation solutions for semiconductor manufacturing by integrating RF Plasma and Microwave Plasma technologies. The systems effectively remove organic contaminants, particles, oxides, photoresist residues, and polymers while improving surface energy and adhesion performance.
The RF Plasma Cleaning System is designed for surface activation and contamination removal before semiconductor packaging processes. It delivers excellent cleaning uniformity, high throughput, and enhanced bonding strength for applications such as Die Bonding, Wire Bonding, Flip Chip, Underfill, and Molding.
The Microwave Plasma Cleaning System features high-density plasma technology for efficient oxide removal, photoresist stripping, polymer cleaning, and non-destructive surface treatment. It significantly improves bonding quality, coating performance, and package reliability.
Available in batch, stand-alone, and fully automated inline configurations, the systems are widely used in HBM, CoWoS, advanced packaging, MEMS, power semiconductors, lead frames, and PCB manufacturing, helping customers achieve higher yield, productivity, and process reliability.