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Heidelberg Instruments Mikrotechnik GmbH

Heidelberg,  Germany
https://heidelberg-instruments.com
  • Booth: R7724

The power of direct writing

Overview

Founded in 1984, Heidelberg Instruments is a global leader in the design, development, and production of high-precision laser lithography systems, maskless aligners, and nanofabrication tools. The company has established itself as a trusted partner and solution provider for industry and academia, with more than 1,500 systems installed worldwide and over 40 years of expertise in advanced lithography and micro- and nanofabrication.

The portfolio ranges from compact systems for R&D and small-series production to advanced photomask manufacturing equipment for high-volume production. Our solutions enable a broad spectrum of micro- and nanoscale patterning applications, supporting both high-resolution 2D structuring and the creation of complex 2.5D topographies through grayscale lithography. By combining precision, flexibility, and automation, Heidelberg Instruments helps customers accelerate innovation while reducing development costs and time-to-market. Typical application areas include photonics, electronics, semiconductors and advanced packaging, displays, quantum devices, MEMS, microfluidics, 2D materials, and photomask production.

Empowering Semiconductor Innovation: Heidelberg Instruments’ precise lithography tools support semiconductor manufacturing and research by addressing critical lithography processes across development and production. The industrial maskless aligner systems can be fully integrated into modern machine execution systems including SECS/GEM with GEM300 support as well as OPC/UA. These capabilities enable high-precision reticle fabrication, maskless exposure, adaptive patterning, and alignment for multilayer devices and advanced packaging.

Today, Heidelberg Instruments employs approx. 400 people worldwide and is headquartered in Germany, with subsidiaries in Japan, Korea, and the United States. The company operates Process and Application Labs in Germany, Switzerland, and China and is part of the LAB14 Group.

In the Chinese and Taiwanese markets, Heidelberg Instruments is represented exclusively by Stella Technology Co., Ltd. Stella Technology will be exhibiting at Booth K2382.

  Press Releases

  • Heidelberg, Germany — Heidelberg Instruments has received a substantial order from a top-tier photomask manufacturer in Asia for a VPG+ 1850 FPD system, developed on the established platform of its flagship VPG+ 1400 FPD Volume Pattern Generator. Delivery is scheduled for Q1/2027.

    “The new VPG+ 1850 FPD will be the largest system in Heidelberg Instruments’ portfolio, engineered specifically for large-format photomask applications beyond G8, supporting mask sizes up to 1400 x 1850 mm²”, says Matthias Wahl, strategic product manager of the VPG series. The VPG FPD series is optimized for display photomask generations typically ranging from G5 to G8.6. With exceptional throughput and precision, the system sets a new industry standard for scalable, high-accuracy photomask production in this field.

    This system upgrade reflects Heidelberg Instruments’ ongoing dedication to innovation in high-performance display manufacturing, serving the rising demand for advanced patterning solutions in the flat panel display (FPD) industry. “The recent order represents another key achievement for Heidelberg Instruments, highlighting our strong market position in display technology, and reaffirming our commitment to driving innovation and excellence in photomask production systems”, states Alexander Forozan, VP of global sales and business development.

    As a trusted partner for photomask manufacturers, particularly in the display industry, Heidelberg Instruments provides reliable systems that are pivotal for enabling next-generation flat panel display production with excellent precision and high throughput. The high-end solutions are specifically engineered to meet the rigorous demands of large-scale manufacturing environments, ensuring consistent quality, economical operation, and outstanding performance across a wide range of advanced applications.

    Click here for further information about the VPG+ 1850 FPD.

  Products

  • MLA 300 | MASKLESS ALIGNER FOR VOLUME PRODUCTION
    The MLA 300 is designed for high-volume production, offering unmatched flexibility and precision in industrial lithography. It supports wafers up to 300×300 mm and adapts to surface variations, eliminating costly, time-consuming mask production....

    • The MLA 300 Maskless Aligner enables innovative solutions for complex lithography challenges such as advanced packaging, sensor calibration, and MEMS fabrication. Combining high throughput, 1.5 µm resolution, a streamlined workflow, and seamless MES integration, it is ideally suited for industrial production environments. Application areas include semiconductors/wafer-level fan-out packaging, IC substrates and high-density interconnects, heterogeneous integration for co-packaged optics, quantum computing, RF components, SAW filter, MEMS devices, displays, electronic probe cards.

    Key features include high‑throughput production with 1.5 µm resolution and an optional 3 µm mode for higher volumes; superior optical quality for precise patterning on demanding substrates; full automation with flexible loading, advanced software designed for production environments, and MES integration; and patented Substrate Tracking Technology with real‑time autofocus to compensate for substrate warp and ensure uniform, flawless patterning.

    Product Highlights and Key Features

    • Minimum lines and spaces: down to 2µm
    • Minimum feature size: down to 1.5µm 
    • Maximum write speed: up to 18000 mm2/min 
    • 2nd layer alignment: down to 500nm 
    • Backside alignment: down to 1000nm 
    • CD uniformity: down to 200nm 
    • Maximum exposure area 315x315mm² 
    • 375 nm and/or 405 nm light source 

  • ULTRA | SEMICONDUCTOR MASK WRITER
    The ULTRA delivers high-throughput, high-precision photomask writing for mature semiconductor nodes. A cost-effective solution for producing photomasks for microcontrollers, PMICs, LEDs, IoT, photonics, and MEMS—maximizing yield, speed, and reliability....

    • The ULTRA Semiconductor Mask Writer integrates state-of-the-art technology to address the primary concerns of modern mask shops: speed, accuracy, and return on investment.

    In the competitive landscape of mature semiconductor fabrication, you face a critical challenge: how to increase throughput and maintain exceptional quality without escalating costs. The ULTRA laser mask writer is engineered to solve this exact problem. It provides a powerful, cost-effective solution for producing photomasks for microcontrollers, power management ICs, LEDs, IoT devices, photonics, and MEMS, delivering the speed, precision, and reliability you need to maximize your yield and profitability.The system’s advanced exposure engine and optimized write modes dramatically reduce mask writing times, enabling customers to produce a standard 6” photomask in less than 45 minutes.

    Product Highlights and Key Features

    • Fast SLM-based Exposure Engine: Delivers write speeds up to 580 mm²/minute without compromising quality.
    • Full Automatic Mask Handling: Reduces operator overhead with a simple, easy-to-use mask loading interface and ensures consistent, repeatable loading and unloading for continuous operation.
    • Optimized Write Modes: Provides the flexibility to prioritize speed or resolution to match your specific job requirements.
    • High-Precision Stage System: A full air-bearing stage and a zero thermal expansion ZERODUR® chuck provide ultimate stability and eliminate thermal drift.
    • Advanced Position Control: A high-resolution differential interferometer system ensures extremely accurate and repeatable feature placement.
    • Tool Matching Functions: On-board correction capabilities allow you to precisely match the output of multiple machines, ensuring consistency across your entire mask set.
  • VPG+200/VPG+400/VPG+800 VOLUME PATTERN GENERATORS
    The VPG+ 200, VPG+ 400, and VPG+ 800 Volume Pattern Generators are powerful and versatile lithography systems designed for multipurpose mask manufacturing for i-line resists.
    ...

    • The VPG+ 200, VPG+ 400, and VPG+ 800 Volume Pattern Generators deliver high-resolution photomask pattern generation for applications requiring exceptional precision, throughput, and alignment accuracy. Designed to process substrates up to 800 × 800 mm², these systems support both small and large format production, making them ideal for advanced microfabrication environments. Featuring interferometer-based positioning with resolution down to 10 nm, VPG+ systems provide highly accurate alignment and exposure performance. Advanced Mura optimization ensures outstanding critical dimension (CD) uniformity and resolution, while closed-loop environmental chambers meet the stringent requirements of modern photomask manufacturing.

    Key Applications 

    • Advanced Packaging: High-precision mask production for fan-out, interposer, and next-generation packaging technologies.
    • Electronics Manufacturing: Photomask fabrication for PCBs, ICs, and electronic components.
    • Microfluidics & MEMS: Creation of intricate mask patterns for emerging microfabrication applications.
    • Display Technologies: Production of high-quality photomasks for LCD, LED, and OLED display manufacturing.

    Product Highlights and Key Features

    • High-resolution pattern generation
    • Substrate handling up to 800 × 800 mm²
    • Ultra-precise alignment with 10 nm interferometer resolution
    • Excellent CD uniformity through Mura optimization
    • Fast exposure performance and high throughput
    • Controlled environment for consistent, repeatable quality

    The VPG+ platform is engineered to meet the evolving demands of advanced semiconductors, electronics, MEMS, microfluidics, and display manufacturing industries.

  • VPG+1400FPD/ VPG+1850FPD VOLUME PATTERN GENERATORS
    Designed for photomask production on large substrates in display applications, and tailored for the high-throughput patterning of large-area photomasks up to G8.6 size and a maximum exposure area of 1400 x 1800 mm....

    • Enhance Your Flat Panel Display Manufacturing: The VPG+ 1400 FPD and VPG+ 1850 FPD Volume Pattern Generators are engineered for photomask production on substrates up to G8.6 (1400 × 1800 mm²), and designed for high-quality and fast exposure with extremely accurate alignment. They feature a differential interferometer with a resolution down to 1.2 nm. Mura optimization ensures excellent CD uniformity and resolution, while the closed-loop environmental chamber complies with the most stringent requirements for advanced photomask fabrication. Ideal for TFT arrays, color filters, and ITO electrodes in high-volume FPD manufacturing. Reliable 24/7 operation ensures consistent quality and delivery.

    The VPG+ 1400 FPD and VPG+ 1850 FPD are designed for high-quality and fast exposures with extremely accurate alignment.

    Product Highlights and Key Benefits

    • Flawless Displays: Optimized for the creation of high-resolution photomasks, including halftone masks, used in the production of key flat panel display (FPD) components such as color filters (CF), thin-film transistor (TFT) arrays, indium tin oxide (ITO) electrodes, touch panels (TP), fine metal masks (FMM), active-matrix organic light-emitting diode (AMOLED) displays, and other liquid crystal display (LCD) and organic light-emitting diode (OLED) layers.
    • Exceptional Throughput: Accelerates photomask production for high-volume display manufacturing.
    • Highest Precision & Reliability: The VPG+ 1400 FPD / VPG+ 1850 FPD deliver the precision and resolution required to create intricate patterns on large-format masks, ensuring flawless transfer of design patterns.
    • Reliable 24/7 Operation: Ensures consistent performance and predictable delivery times.
    • Advanced Metrology: Includes a metrology package and tool-matching functions that enable precise second-layer alignment for large-area greytone mask production.
    • Alignment Precision: Uses differential interferometry for ultra-precise patterning.
    • Mura Optimization: Achieves excellent CD uniformity and high resolution across large areas.
    • Closed-Loop Environmental Chamber: Maintains thermal and particle stability to ensure consistently high-quality results.

Categories

200 Equipment, Assembly
  • Lithography Systems for Wafer Level Packaging; Bumping; 3D Interconnect Aligners
    • 204 Equipment, Mems
  • Double sided mask aligner
    • 205 Equipment, Nanotechnology
  • Equipment, Nanotechnology Tools
    • 207 Equipment, Process
  • Lithography; Exposure; Aligners; Direct Write Systems; Steppers; Scanners; Nanoimprint
    • 700 Manufacturing Services
  • Lithography; Patterning service

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