1. NX-Wafer(For 300 mm Wafers)
Designed for wafer process monitoring, defect analysis (ADR), CMP planarization measurement, and high-resolution nanoscale surface metrology.
Key Features:
- Automatic Defect Review (ADR)
- Ultra-high-resolution nanoscale metrology
- CMP process measurement
- Fully automated operation
2. NX-Wafer Plus(For 300 mm Wafers)
An advanced nanoscale metrology system built on the NX-Wafer platform, specifically designed for advanced packaging, wafer bonding, and wafer edge metrology applications.
Key Features:
- High-speed Wafer Edge Roll-Off (ERO) measurement
- Off-axis optical navigation system with wafer rotation stage
- Fully automated measurement workflow
- Fab-ready integration capability
- Non-contact measurement mode
3. NX-HDM(For 150 mm Wafers)
A fully automated Atomic Force Microscope (AFM) designed for semiconductor R&D, Failure Analysis (FA), Quality Assurance (QA), dielectric materials, and substrate process applications.
Key Features:
- Automatic Defect Review (ADR)
- Nanoscale surface roughness measurement
- Non-contact measurement mode
- Automatic wafer handling with EFEM
- Orthogonal Scan System