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Taiwan Kong King, Co., Ltd.

Chupei City, Hsinchu Hsien,  Taiwan
http://www.tkk.com.tw
  • Booth: J2538

"TKK -The Key to Success "

Overview

TKK has always been devoted to providing the latest technical resources to the industry and delivering professional and dedicated service to our customers. TKK is a well-established distributor of equipment and materials serving the semiconductor, PCB, and optoelectronics industries, including optical communication and silicon photonics, PCB manufacturing equipment, semiconductor equipment, chemical materials and processing systems, and software solutions. With our expertise and extensive experience, TKK is fully capable of providing equipment and services for complete factory production lines.

To stay at the forefront of industry trends, TKK continues to introduce advanced equipment for high-end PCB technologies and semiconductor applications. We also provide complete production equipment solutions for flexible PCBs to meet the needs of the 3C industry. Furthermore, TKK has expanded into the optoelectronics sector, chemical applications, and precision testing equipment. We are committed to providing a full range of equipment and services to meet the growing and diverse needs of our customers.


  Products

  • Sikama Reflow
    Designed for 8-inch and 12-inch wafer eutectic reflow, fluxless reflow, and wafer coating applications. Stable temperature control enables customers to achieve consistent and reliable manufacturing processes....

  • 1. EA up1200 (Hydrogen-Activated Fluxless Reflow Furnace)
    • Maximum Process Temperature: 400°C / Temperature Uniformity: ±2°C
    • Maximum Substrate Size: 12.8(L) × 12.8(W) inches
    • Specifications:A. Wafer Size: 8" & 12" / B. Dimensions (W × D × H): 356 × 119 × 196 cm
    2. UP1200 (8"/12" Wafer Bump Reflow Furnace)
    • Maximum Process Temperature: 400°C / Temperature Uniformity: ±2°C
    • Maximum Substrate Size: 12.5(L) × 12.5(W) inches
    • Specifications:A. Wafer Size: 8" & 12" / B. Dimensions (W × D × H): 295 × 117 × 201 cm / C. Weight: 680 kg
    3. FALCON 8500 (Optimized for 8" Wafer Bump Reflow)
    • Maximum Process Temperature: 400°C / Temperature Uniformity: ±2°C
    • Maximum Substrate Size: 8(L) × 11(W) inches
    • Specifications:A. Wafer Size: 8" / B. Dimensions (W × D × H): 251 × 61 × 117 cm
    4. FAlcon 1200 (Optimized for 12" Wafer Bump Reflow)
    • Maximum Process Temperature: 400°C / Temperature Uniformity: ±2°C
    • Maximum Substrate Size: 11.8(L) × 11.8(W) inches
    • Specifications:A. Wafer Size: 12" / B. Dimensions (W × D × H): 164 × 61 × 114 cm
    5. FAlcon 5c (Benchtop Reflow Furnace)
    • Maximum Process Temperature: 400°C / Temperature Uniformity: ±2°C
    • Maximum Substrate Size: 5(L) × 5.75(W) inches
    • Dimensions (W × D × H): 135 × 64 × 66 cm
    • 6. FAlcon ICS412 (In-Line Wafer Coating System)
    • Designed for wafer bump flux coating applications, programmable servo-driven rotation speed: 1–2000 rpm
    • Maximum Substrate Size: 11.8(L) × 11.8(W) inches
    • In-line transport design compatible with various automation systems, including robotic arms, wafer handling systems, and other transfer equipment
    • Specifications:A. Wafer Size: 4"–12" / B. Dimensions (W × D × H): 109 × 107 × 104 cm
  • Semtek Cleaner
    Semiconductor Fully Automated Cleaning Equipment...

  • 1. Carrier Cleaner
    • Uses DI Water (DIW) throughout the entire cleaning process.
    • Suitable for cleaning carriers such as FOUP/FOSB, Magazine, Boat/Jig, Frame/Tray, Cassette, Frame CST, and Tray CST.
    • High-pressure nozzles combined with software enable targeted cleaning.
    • Adjustable nozzle angle and spray direction.
    • Reduces process contamination.
    • Saves up to 30% of floor space.
    • Effectively removes particles, AMC, residual photoresist, and adhesive residues.
    2. Wafer Flux Cleaner
    • Designed for advanced packaging wafer cleaning processes.
    • Equipped with nano-atomizing nozzles and matrix cleaning technology.
    • Provides high-pressure or atomized cleaning according to product type and feature pitch.
    • Enhanced localized cleaning capability based on process requirements.
    • Cleans gaps as small as ≤ 40 μm.
    • Targeted cleaning capability.
    • Interchangeable nozzles to meet process requirements.
    • Hybrid cleaning capability.
    3. Die form cleaner
    • Designed for 2.5D and 3D packaging processes for flux residue removal.
    • Uses DI Water (DIW) throughout the entire cleaning process.
    • Fully automated cleaning operation can be configured.
    • Adjustable base plate tilt angle.
    • Targeted cleaning capability.
    • Adjustable nozzle angle.
    • Cleans gaps as small as ≤ 40 μm.
  • Hirata Wafer/Panel Machine
    Transportation Equipment Systems for Major Semiconductor Manufacturing Processes...

  • 1. Wafer Sorter
    • High-cleanliness, high-performance wafer sorting system with flexible configurations to meet various application requirements: Infinite Freedom Series.
    • Supports GEM300 communication protocol and automation standards.
    • Equipped with an AC servo control system for high-speed and stable wafer handling operations.
    • Flexible customized configurations.
    • High-cleanliness environmental control.
    • High-rigidity drive mechanism.
    2. Wafer efem
    • Provides automation integration services for semiconductor manufacturing equipment and can be configured with front-end automation modules for different wafer sizes.
    • Compact footprint design.
    • Equipped with an AC servo control system for high-speed and stable wafer handling operations.
    • Flexible customized configurations.
    • High-cleanliness environmental control.
    • High-rigidity drive mechanism.
    3. Panel EFEM
    • Provides automation integration services for semiconductor panel manufacturing equipment and can be configured with front-end automation modules for different panel sizes.
    • Compact footprint design.
    • Equipped with an AC servo control system for high-speed and stable wafer handling operations.
    • Flexible customized configurations.
    • High-rigidity drive mechanism.
  • HIOKI FA1816 Flying Probe Tester
    Now with newly developed low-impact probes and precision soft-landing control 30% faster cycle times for gold plating and fine pattern testing...

  • Features
    • High-Speed Testing at Up to 100 points/sec.
    • Featuring newly designed probes and precision control for half the impact mark depth of previsous designs.
    • Rapid testing, regardless of board type: Easily position the target board and start testing, even for thin-film boards and thick, round boards.
    • High-speed pattern testing using capacitance measurement.
    • Methods for calculating the number of test steps.
  • Minami Ball Placer/Ball Mount
    Specializing in Semiconductor Packaging and SMT Process Equipment
    Our product portfolio covers high-precision printers, ball placement systems, solder ball inspection and rework equipment, providing advanced solutions for semiconductor packaging processes....

  • 1. mk-BP5000(Ball Placer/Ball mount)
    • New Transfer System: Dual Table transfer system enables stable quality control and high productivity.
    • Exclusive Technologies: Equipped with a rotary squeegee system and cyclone-type ball placement head for enhanced placement performance.
    • Applicable Solder Ball Size: φ60 μm ~ φ600 μm (Other sizes available upon request.)
    • Features: Automatic solder ball feeding system. / Automatic flux supply system.
    2. mk-BP5000IR(Ball Inspection & Rework)
    • New Transfer System: Dual Table transfer system achieves stable quality and high-speed production.

      Solder Ball Inspection System: High-speed and high-precision inspection capability.

      Solder Ball Rework System: Supports solder balls from φ45 μm ~ φ600 μm.
      Repairs missing balls, duplicated balls, positional shifts, and other placement defects.

      Repeatability Accuracy: ±10 μm

    3. MK-D13(Printer)
    • Solder Ball Forming Stencil Printer.

      Multi-Chip Printing Capability: Simultaneous printing of multiple units (Max. 60 pcs/tray). Enables multi-unit printing on a single PCB carrier tray.

      High Precision(±15 μm): Individual unit position correction through advanced image recognition technology.(Multi-unit alignment printing accuracy: ±25 μm.)

      High Throughput(UPH: Over 1,000 units.): Using a tray configuration of 50 pcs, achieves approximately 1.4× higher throughput compared with conventional equipment (maximum 24 pcs).

      Optional Feature: Rotary squeegee system available.

  • Park AFM
    Advancing Precision Analysis with Innovative Nanoscale Metrology
    Delivering innovative metrology solutions for precise analysis, advanced process control, and superior product quality....

  • 1. NX-Wafer(For 300 mm Wafers)

    Designed for wafer process monitoring, defect analysis (ADR), CMP planarization measurement, and high-resolution nanoscale surface metrology.

    Key Features:

    • Automatic Defect Review (ADR)
    • Ultra-high-resolution nanoscale metrology
    • CMP process measurement
    • Fully automated operation

    2. NX-Wafer Plus(For 300 mm Wafers)

    An advanced nanoscale metrology system built on the NX-Wafer platform, specifically designed for advanced packaging, wafer bonding, and wafer edge metrology applications.

    Key Features: 

    • High-speed Wafer Edge Roll-Off (ERO) measurement
    • Off-axis optical navigation system with wafer rotation stage
    • Fully automated measurement workflow
    • Fab-ready integration capability
    • Non-contact measurement mode

    3. NX-HDM(For 150 mm Wafers)

    A fully automated Atomic Force Microscope (AFM) designed for semiconductor R&D, Failure Analysis (FA), Quality Assurance (QA), dielectric materials, and substrate process applications.

    Key Features:

    • Automatic Defect Review (ADR)
    • Nanoscale surface roughness measurement
    • Non-contact measurement mode
    • Automatic wafer handling with EFEM
    • Orthogonal Scan System

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