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牛津儀器股份有限公司

  • Booth: I2022

Welcome to visit us at Booth I2022 to meet our experts!

Overview

Oxford Instruments is a leading provider of high technology products and services to the world's leading companies and scientific research communities in compound semiconductors industry. Our business images, analyzes, and manipulates materials down to the atomic and molecular level, enabling our customers to accelerate their R&D, increase productivity, and make new scientific discoveries. 

Advance your semiconductor fabrication and characterisation processes with Oxford Instruments’ full spectrum of solutions. Such as:

  • Atomfab ALD: High-throughput Atomic Layer Deposition (ALD) system designed for large-scale manufacturing of advanced semiconductor devices, including GaN power devices. Known for exceptional uniformity, conformality, and low cost per wafer.
  • PlasmaPro 100: Versatile plasma etch, deposition, and ALE platform offering a variety of plasma processes for high-volume device manufacturing for InP/GaAs optoelectronics, GaN/SiC power devices, as well as processes for microLED, sensors and MEMS. Offers excellent process control and uniformity for consistent results.
  • Ionbeam: Our ion beam etch (IBE) is a popular choice for high-quality slanted and blazed grating etch & ion beam deposition (IBD) processes. Flexible hardware options include open load, single-substrate load lock, and cassette-to-cassette configurations. Specifications are tailored to each application, enabling faster, repeatable process results.
  • Ultim Extreme Infinity (EDS): Energy Dispersive Spectroscopy (EDS) systems known for their superior resolution, speed, and reliability, enabling rapid elemental analysis and mapping for process monitoring, quality control, and failure analysis in semiconductor devices.
  • Symmetry S3 (EBSD): A fast and accurate Electron Backscatter Diffraction (EBSD) system for high resolution analysis of grain structure, crystal orientation, and strain.
  • FemtoTools Nanoindenter: Instruments for the reliable and precise characterisation of mechanical properties in a wide variety of applications.

牛津儀器(Oxford Instruments)是全球領先的高科技產品與服務供應商,專為頂尖企業及科學研究機構提供協助。我們的技術可在原子與分子層級上進行材料的成像、分析與處理,幫助客戶加速研發、提升生產力並推動科學研究。

透過牛津儀器的全方位解決方案,您將能夠提升半導體製程與材料特性分析的流程。我們的拉曼成像顯微鏡可測量晶體均勻性、材料應力及應變,原子力顯微鏡可確認缺陷、粗糙度及電子特性。此外,我們提供尖端的電漿蝕刻、原子層沉積設備、及界面優化等解決方案。


  Press Releases

  • (Jul 30, 2026)
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  • (Jul 30, 2026)
  • (Jul 30, 2026)

  Products

  • Atomfab ALD
    High-throughput Atomic Layer Deposition (ALD) system designed for large-scale manufacturing of advanced semiconductor devices, including GaN power devices. Known for exceptional uniformity, conformality, and low cost per wafer....

  • High-throughput Atomic Layer Deposition (ALD) system designed for large-scale manufacturing of advanced semiconductor devices, including GaN power devices. Known for exceptional uniformity, conformality, and low cost per wafer.
  • PlasmaPro 100
    Versatile plasma etch, deposition, and ALE platform offering a variety of plasma processes for high-volume device manufacturing for InP/GaAs optoelectronics, GaN/SiC power devices, as well as processes for microLED, sensors and MEMS....

  • Versatile plasma etch, deposition, and ALE platform offering a variety of plasma processes for high-volume device manufacturing for InP/GaAs optoelectronics, GaN/SiC power devices, as well as processes for microLED, sensors and MEMS. Offers excellent process control and uniformity for consistent results.
  • Ionbeam
    Our ion beam etch (IBE) is a popular choice for high-quality slanted and blazed grating etch & ion beam deposition (IBD) processes. Flexible hardware options include open load, single-substrate load lock, and cassette-to-cassette configurations....

  • Our ion beam etch (IBE) is a popular choice for high-quality slanted and blazed grating etch & ion beam deposition (IBD) processes. Flexible hardware options include open load, single-substrate load lock, and cassette-to-cassette configurations. Specifications are tailored to each application, enabling faster, repeatable process results.
  • Ultim Extreme Infinity (EDS)
    Energy Dispersive Spectroscopy (EDS) systems known for their superior resolution, speed, and reliability, enabling rapid elemental analysis and mapping for process monitoring, quality control, and failure analysis in semiconductor devices....

  • Energy Dispersive Spectroscopy (EDS) systems known for their superior resolution, speed, and reliability, enabling rapid elemental analysis and mapping for process monitoring, quality control, and failure analysis in semiconductor devices.
  • Symmetry S3 (EBSD)
    A fast and accurate Electron Backscatter Diffraction (EBSD) system for high resolution analysis of grain structure, crystal orientation, and strain....

  • A fast and accurate Electron Backscatter Diffraction (EBSD) system for high resolution analysis of grain structure, crystal orientation, and strain.
  • WITec alpha300 Raman Microscopes
    Enable non-destructive, label-free chemical characterisation with high spectral and spatial resolution, offering comprehensive analysis for diverse materials and life science applications without sample preparation....

  • Enable non-destructive, label-free chemical characterisation with high spectral and spatial resolution, offering comprehensive analysis for diverse materials and life science applications without sample preparation.

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