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3D-Micromac AG

Chemnitz,  Germany
http://www.3d-micromac.com
  • Booth: 1261

Overview

3D-Micromac AG is a leading provider of laser micromachining systems for high-precision applications in semiconductor manufacturing and advanced electronics. We offer innovative laser solutions for key processes, including Ohmic Contact Formation (OCF) for SiC power devices, laser pinning for GMR sensors, laser link trimming, and sample preparation for failure analysis and quality assurance.

3D-Micromac also holds extensive expertise in the processing (cutting, drilling, ablating) of various materials (Si, SiC, glass, stacks) used in the semiconductor industry.


  Products

  • microPREP™ PRO FEMTO
    Boost efficiency in semiconductor labs with microPREP® PRO FEMTO: the femtosecond laser system for fast, non-destructive sample prep. Achieve high-resolution results, cut time-to-sample, and lower costs when handling complex multilayer structures....

  • microPREP® PRO FEMTO is 3D-Micromac’s high-precision femtosecond laser ablation system for advanced sample preparation in semiconductor failure analysis & device characterization. Unlike mechanical polishing or ion beam milling, it uses ultrashort laser pulses for selective material removal with minimal thermal or mechanical impact. This enables fast, non-destructive cross-sectioning and delayering, especially for large areas or coarse removal, making it a powerful alternative or complement to FIB. The system handles a wide range of materials and geometries, including metals, semiconductors, ceramics, polymers, and composites. A user-friendly software with predefined workflows ensures reproducibility and seamless integration into SEM, TEM, APT, X-ray tomography, or micromechanical testing. By accelerating time-to-sample and reducing tool bottlenecks, microPREP PRO FEMTO increases throughput, lowers cost of ownership, and boosts lab efficiency—ideal for today’s complex semiconductor challenges.
  • microPRO XS OCF
    With selective laser annealing, the microPRO XS OCF delivers precise ohmic contact activation on SiC wafers. Achieve top-level performance with minimal thermal impact, outstanding uniformity, and low cost of ownership for power device production....

  • Selective laser annealing enables targeted activation of functional layers with minimal thermal impact on surrounding structures – a key technology in advanced semiconductor production. Our systems offer outstanding process uniformity, repeatability, and efficiency at an industrial scale.

    The microPRO XS OCF enables accurate activation of ohmic contacts on SiC wafers for power device applications. It delivers application-optimized annealing at the highest technological level while maintaining a low CoO.

  • microVEGA® xMR
    The award-winning microVEGA® xMR uses selective laser annealing to precisely align magnetic layers for GMR and TMR sensors. Proven in high-volume sensor chip production, it ensures uniformity, repeatability, and efficiency at an industrial scale....

  • Selective laser annealing enables targeted activation of functional layers with minimal thermal impact on surrounding structures – a key technology in advanced semiconductor production. Our systems offer outstanding process uniformity, repeatability, and efficiency at an industrial scale.

    The award-winning microVEGA xMR precisely aligns magnetic layers for GMR and TMR sensors and is used worldwide in the high-volume production of monolithically integrated sensor chips.


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