DF-2000 is a dry film negative tone photoresist that comes in thicknesses from 3 to 50 um and in widths for 200 and 300mm wafers. Applications include manufacturing printer heads, medical microfluidics, fabricating acoustic filters, metallization and etching of wafers, sealing TSV's mainly for use in permanent applications. The material has very consistent batch to batch photospeed and features as small as 2 to 3um are possible with the 3 to5um film.