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Particle Measuring Systems, Inc.

Niwot,  CO 
United States
http://www.pmeasuring.com
  • Booth: 535

Discover Cleanroom Control with PMS – Booth 535.

Overview

Discover how Particle Measuring Systems delivers industry-leading sensitivity in contamination monitoring—covering air, gas, liquids, chemicals and Airborne Molecular Contaminants—critical for fab yield and product integrity. Meet our global experts at Booth #535 to explore real‑time, point‑of‑use solutions tailored to your process. We look forward to showing you what best‑in‑class monitoring can do.

Join our global experts at SEMICON West 2025 to explore cleanroom and process monitoring technologies that support precision, compliance, and control. From ultrapure water to cleanroom air, we help optimize your environment and protect your product.

Stop by Booth #535 to see what best-in-class contamination monitoring can do for your fab.


  Press Releases

  • Niwot, CO —August 19, 2025— Particle Measuring Systems is proud to announce the opening of its new state-of-the-art Manufacturing & Contamination Control Innovation Hub, marking a major milestone in the company’s evolution and long-term growth and investment strategy. This purpose-built facility is designed to support innovation, enhance customer engagement and service delivery, and expand manufacturing capabilities—solidifying our leadership in advancing contamination-free manufacturing and sterility assurance.

    Located in Niwot, CO, the completed facility spans over 80,000 square feet with an additional 20,000 square feet reserved for future growth and expansion. It features six dedicated project labs focused on innovation and product development, 60 percent more space for advanced production and service capabilities, and more than a dozen collaborative workspaces designed to foster cross-functional teamwork and accelerate product development.

    “Our new headquarters is more than a building—it’s a strategic investment in our people, our technology, and our future,” said Andy Cowan, PMS President. “With flexible project rooms, smart systems, and wellness-focused design, we’re creating an environment where creativity and collaboration thrive.”

    “This facility was designed with innovation, scalability and operational excellence at its core,” said Matt Morton, Vice President of Operations. “From expanded production lines to integrated project labs, every element supports faster innovation cycles, stronger cross-functional collaboration, and the flexibility to grow with our customers’ evolving needs.”

    This move positions Particle Measuring Systems to meet increasing demand, drive operational efficiency, and strengthen our ability to deliver innovative solutions. It also enhances our capacity to host customer visits, pilot new technologies, and collaborate with local partners and universities, reinforcing our role in the broader community and industry ecosystem.

    The project took over three years to complete, reflecting a deep commitment to thoughtful planning, employee experience, and long-term scalability for our future.

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  Products

  • Chem 20™ Chemical Particle Counter
    Leading-edge microelectronic processes require very clean process chemicals that are regulated to a particle size of 20 nm or below. With 20 nm particle sensitivity, the Chem 20 Chemical Particle Counter supports a large variety of chemicals....

  • Leading-edge microelectronic processes require very clean process chemicals that are highly filtered and regulated to a particle size of 20 nm or below. With 20 nm particle sensitivity, the Chem 20 Chemical Particle Counter from Particle Measuring Systems (PMS) supports the International Roadmap for Devices and Systems (IRDS) and a large variety of chemicals. 

    Extensive data on chemical distribution and packaging systems proves that the Chem 20 chemical particle counter, with 20 nm sensitivity, detects larger concentrations of particles with better statistics than competitive products. The Chem 20 Chemical Particle Counter is a valuable tool that enables facility and process engineers to quickly detect and characterize chemical particle sources before they impact process and device performance. Supporting both online and sample based monitoring, the Chem 20 particle counter provides flexible monitoring from incoming QC to point of use.

    Product features

      • Overcoming Background Scatter
      • Laser Safety
      • Sensing Bubbles in Sample Flow
      • Handling a Reduction in Sample Flow
      • Leak Detection
      • Obtaining Stable and Repeatable Data 

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  • Condensation Particle Counter CPC NanoAir™ 10
    Designed to monitor ultra-clean environments, the Nanoair delivers 10 nm detection sensitivity at a sample flow rate of 2.8 L/min (0.1 CFM)....

  • The NanoAir™ 10 Condensation Particle Counter (CPC) is a revolutionary new product from Particle Measuring Systems (PMS). It provides the sensitivity of a CPC with the ease of use and functionality of a traditional cleanroom particle counter. Designed to monitor ultra-clean environments, it delivers 10 nm detection sensitivity at a sample flow rate of 2.8 L/min (0.1 CFM).


    The NanoAir 10’s size is 83% smaller than competitive condensation particle counters making it practical to use anywhere in ultra-clean environments, including inside semiconductor process tools and equipment front-end modules (EFEM). The innovative patent-pending working fluid handling system design is robust and efficient, enabling 24/7, 365 days continuous operation without the need for maintenance or user intervention of any kind between the annually required working fluid refill and calibration. Thereby, reducing sampling and data collection interruptions and tool downtime.

    A 10-port manifold companion product (ParticleSeeker™) supports applications that require multiple sample locations to be monitored in sequential or programmed sequences.

    Additionally, the NanoAir condensation particle counter is high-pressure gas compatible with the HPD-III from PMS, and data can be viewed, analyzed, and reported using PMS Facility Net facility monitoring software or transmitted directly to third-party SCADA systems or process tool inputs.

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