Manufacturer of Plasma Etch, Strip, and Deposition Systems
Overview
Trion Technology, Inc. (founded in 1989; a USA company) designs and manufactures versatile plasma equipment (ICP-RIE, PECVD, PVD, ashers, and more) to enable our customers in the semiconductor, MEMS, LED, RF power, failure analysis, optoelectronics, III-V, wafer level packaging, thin film head, and solar industries.
Etch capabilities include GaN, GaAs, Si, SiO2, SiN, Si3, and more. Deposition processes include Si, SiO2, SiN, ALD, and PVD applications.
Our products feature the smallest footprint and lowest cost systems in the industry, with proven production reliability. If you wish for anything from full-blown production cluster tools to a simple laboratory system, Trion makes it. For more information, contact us: website https://triontech.com | email [email protected] | telephone +1 727-461-1888.