Schunk Xycarb Technology BV

  • Booth: 5231

Welcome to Schunk Xycarb Technology!

Overview

Schunk Xycarb Technology produces high-tech consumable parts made of quartz, graphite, and ceramics for the semiconductor, LED, silicon, and solar industries. With over 600 professionals, we contribute to the production of devices used in computers, lasers, LED, cars, and smartphones.

As part of the Schunk Group, with more than 10,000 employees in 26 countries, we combine expertise in materials engineering and machine design. Headquartered in the Netherlands, Schunk Xycarb Technology has production and sales facilities in Europe, the US and Asia.

Our engineering teams support the fast-developing microelectronics industries with high-precision machining and coating capabilities. We invest in new materials and technologies through our R&D facilities, aiming to serve customers with the highest standards of collaboration and efficiency. Our global network ensures localised service and support, geared towards providing Pure Excellence.


  Products

  • Centura® chamber Centura®腔室
    Material: SiC-Coated Graphite & Quartz Application: Si-based epitaxial deposition Platform: Applied Materials Centura® 材料:碳化硅涂层石墨和石英 应用:硅基外延沉积 平台:应用材料公司Centura®...

  • Characteristics: 
    • Stable and better uniformity during lifetime
    • Proven record of performance in the highest technology nodes

    特点:
    • 使用寿命期间稳定且均匀性更好
    • 在最高技术节点上表现优异

  • TaC disc TaC 光盘
    Material: TaC Coated Graphite Application: SiC Epitaxy and SiC crystal growing TaC coating has a melting point ~3,880 °C which allows for: 3880°C 材料:TaC涂层石墨 应用:SiC外延生长和SiC晶体生长 TaC涂层的熔点约为3880°C,可实现:3880°C...

  • - Easy removal of parasitic SiC in SiC Epi 
    - Reduces cost of ownership due to longer life  

    - 轻松去除SiC外延中的寄生SiC
    - 使用寿命更长,从而降低拥有成本

  • SiC Ring SiC 环
    Material: Solid CVD SiC • Application: Single-wafer SiC Epitaxial Deposition 材料:固体CVD SiC 应用:的单晶片SiC外延沉积。...

  • Characteristics: Steady & uninterrupted supply of HVM quantities

    特点:稳定且不间断地供应高真空量。

  • Single wafer SiC epitaxial reactor 单晶硅碳外延反应器
    • Material: CVD SiC Coated Graphite • Application: Single-wafer Si Epitaxial Deposition • 材料:CVD SiC 涂层石墨 • 应用:单晶硅外延沉积...

  • • Characteristics: Steady & uninterrupted supply of HVM quantities. World class SiC coating technology

    • 特点:稳定且不间断地供应高真空量。世界一流的 SiC 涂层技术。

  • RTP ring RTP环
    • Material: Silicon-coated SiC • Application: Rapid Thermal Processing (RTP) • 材料:碳化硅 • 应用:快速热处理(RTP)...

  • Characteristics: Steady & uninterrupted supply of HVM quantities

    • 特点:稳定且不间断地供应高真空量。