SVCS Process Innovation s.r.o.

Brno,  Czech Republic
http://www.svcs.com
  • Booth: 2171

Front-end Semiconductor equipment from the Heart of Europe

Overview

                                                                                                                      

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Our experience is based on a long history and tradition of the semiconductor industry in former Czechoslovakia, in a place called the Czech Silicon Valley. 

For over 25 years we have been striving towards development of the tomorrow’s tools and tomorrow’s process innovations. To do this successfully, we cooperate with leading R&D laboratories, universities and scientific institutes.

The company’s headquarters and production plant are located in the Czech Republic. We have world wide network of business representatives, including USA, EU and ASIA.

SVCS has delivered installations for customers all over the Planet, for example: Australia, Belarus, Belgium, France, Denmark, Germany, China, India, Japan, Korea, Lithuania, Malaysia, Mexico, Poland, Russia, Slovakia, Taiwan, UK and the USA.

        


  Products

  • Horizontal furnace
    Designed for High Performance in Production Environment while stays Efficient and Economic...

  • Features and Benefits

    • Maintenance friendly mechanical design
    • State of the art modular control system, in-house designed and manufactured
    • 10,4“ high-res touchscreen for operator interface
    • Up to 4 stacked quartz or SiC tube reactor chambers for various procesess
    • No thermal interference between different tubes
    • Contactless fully automated boat-in-tube loading both cantilever or softlanding configurations
    • Independent tube level control system
    • HW safety interlocks independent on main CPU
    • HEPA or ULPA filtres installed in load station
    • Boat elevator and wafer handling automation
    • UHP face seal fittings and welds for connections
    • UHP orbital weldings made in 100/10 Cleanroom

    Atmospheric Processes

    • Diffusion (drive-in) high temperature procesess
    • Doping from solid, liquid and gaseous dopant sources e.g.: BBr3, B2H6, POCL3, PH3, BN
    • Various thermal processing e.g. annealing, sintering
    • Pyrogenic Wet Oxide with External Burning System
    • Wet Oxide with ultra pure steamer
    • Dry Oxide

    LPCVD Processes

    • Silicon nitride
    • Low temperature oxide (LTO)
    • High temperature oxide (HTO)
    • TEOS oxide
    • Polysilicon, with tilt/flat temperature profile
    • Doped polysilicon
    • Oxynitride

    PECVD Processes

    • Silicon nitride (incl. anti-reflective SiN solar cell coating)
    • Silicon oxide
    • Oxinitride
  • Vertical furnace
    Configurable for Production or R&D Applications...

  • SVCS Vertical Thermal Reactor (VTR) is designed for all standard atmospheric and low pressure CVD processes. VTR is available with several lengths of flat zone for both mass production and R&D application. The single tube set-up with dual boat logistics is optimized for minimum down time as well as  low maintenance costs.

    Features and Benefits

    • Automatic wafer handling system for loading wafers from SMIF or FOUP closed pods
    • Special automatic loading system which allows loading wafers from open cassettes and provides an exceptionally small footprint
    • Quartz or SiC boats can be used 
    • Highly tailored state of the art modular control system, in house designed and manufactured
    • 10,4“ high-res touchscreen for operator interface 

    Atmospheric Processes

    • Diffusion (drive-in) high temperature procesess
    • Doping from solid, liquid and gaseous dopant sources e.g.: BBr3, B2H6, POCL3, PH3, BN
    • Various thermal processing e.g. annealing, sintering
    • Pyrogenic Wet Oxide with External Burning System
    • Dry Oxide

    LPCVD Processes

    • Silicon nitride / low stress nitride
    • Low temperature oxide (LTO)
    • High temperature oxide (HTO)
    • TEOS oxide
    • Polysilicon, with tilt/flat temperature profile
    • Doped polysilicon
    • Oxynitride
  • Compact tabletop furnace
    Unique Compact Design, All Features of the Grown-up Furnace...

  • The SVCS Tabletop Furnace system provides a semiconductor grade quality tool for universities, R&D laboratories and pilot fabs. This system can be used for wide range of processes due to outstanding flexibility and amount of optional modules available to meet special and often unique requirements of every customer.

    Atmospheric Processes

    • Diffusion (drive-in) high temperature procesess
    • Doping from solid, liquid and gaseous dopant sources e.g.: BBr3, B2H6, POCL3, PH3, BN
    • Various thermal processing e.g. annealing, sintering
    • Pyrogenic Wet Oxide with External Burning System
    • Wet Oxide with ultra pure steamer
    • Dry Oxide

    LPCVD Processes

    • Silicon nitride
    • Low temperature oxide (LTO)
    • High temperature oxide (HTO)
    • TEOS oxide
    • Polysilicon, with tilt/flat temperature profile
    • Doped polysilicon
    • Oxynitride

    PECVD Processes

    • Silicon nitride (incl. anti-reflective SiN solar cell coating)
    • Silicon oxide
    • Oxinitride

  • High temperature furnace
    New All-in-one solution for new era of wafer production...

  • Temperatures up to 2000°C

    | Hermetically sealed loading area

    | Controlled atmoshpehe loadlock chamber

    | Vacuum processes

    | Touchscreen operator interface placed on cleanroom wall

    | Automatic wafer handling system for loading wafers

    | Unique temp. measurement by spike and profiling TC combine with pyrometry

    | 7 independent water cooling circuits with the flow rate and temp. monitoring

  • Gas Cabinets, VMBs, Gas Panels
    Tailored gas systems and gas panels for various wafer production technologies...

  • SVCS takes advantage of many years of experience in manufacturing tailored gas panels and gas systems for various wafer production technologies, as well as various R&D customized panels. SV-DELI gas delivery system family offers a high level of technical design, components from the world leaders and a fully automatic control system with independent safety functions.