Overview
Xuzhou B&C Chemical Co., Ltd. is a national high-tech enterprise focusing on the R&D and manufacturing of medium- to high-end photoresists and related raw materials. Established in March 2010, Xuzhou B&C has an R&D center in Lingang Science and Technology Park, Songjiang, Shanghai, a pilot trial base in Jinshan, Shanghai, and two production bases in Pizhou, Jiangsu and Dongyang, Zhejiang, respectively.
According to the national development plan for semiconductors as a strategic emerging industry, Xuzhou B&C actively strives for vantage points in the development of photolithography in integrated circuit, and has become the only domestic photoresist supplier to cover the full industry chain of "monomers-resins and PAGs-photoresists" by making breakthroughs in raw materials, and also made substantial breakthroughs in ensuring the security, independence and controllability of the domestic photoresist material industry chain. To date, Xuzhou B&C has developed ArF/KrF monomers and photoresists, G-line and I-line photoresists, and an E-beam photoresist series with nearly one hundred products successfully, with its customer base covering over 70 domestic chip manufacturers. In particular, ArF-immersion products have been applied to 28-45nm manufacturing processes and can be applied to the 14nm manufacturing processes. Thanks to our unique perspective on the complete industry chain and industrialization advantages, Xuzhou B&C can customize R&D efforts, and set up nearby photoresist production centers to maintain the stable, fast and reliable supply of lithography materials.